极紫外波段Ar光谱分析在EAST偏滤器杂质屏蔽效应研究中的应用  

Application of Extreme-Ultraviolet Ar Spectra Analysis in the Study of Divertor Impurity Screening in EAST Tokamak

作　　者：张鹏飞[1,2] 张凌[1] 许棕 段艳敏[1] 吴承瑞 黄娟[1] 吴振伟[1] 郭后扬[1,3] 胡立群[1] 

机构地区：[1]中国科学院等离子体物理研究所,安徽合肥230031 [2]中国科学技术大学研究生院科学岛分院,安徽合肥230031 [3]General Atomics,P.O.Box 85608,San Diego,California 92186,USA

出　　处：《光谱学与光谱分析》2016年第7期2134-2138,共5页Spectroscopy and Spectral Analysis

基　　金：国家磁约束核聚变能发展研究专项项目(2014GB124006);国家自然科学基金项目(11305214,11105181,11275231)资助

摘　　要：在托卡马克偏滤器区域充入杂质气体是检验偏滤器杂质屏蔽效应的重要手段。利用快速极紫外EUV光谱仪对EAST托克马克装置上开展的偏滤器Ar杂质注入实验进行观测。结合NIST原子光谱数据库对2～50 nm范围内不同电离态Ar的线光谱进行了谱线识别,识别出ArⅣ,ArⅨ-Ⅺ,Ar XⅣ-XⅥ等若干个电离态的谱线。为了同时观测等离子体不同区域的Ar杂质行为,在杂质注入实验时重点监测Ar XⅥ35.39 nm（Ar XⅥ电离能918.4 eV,主要分布在等离子体芯部）和ArⅣ44.22 nm（ArⅣ电离能9.6 eV,主要分布在等离子体边界）这两条谱线。利用该两条谱线强度随时间演化的结果初步分析了偏滤器杂质屏蔽效应。在同一充气口不同等离子体位形下的实验结果表明偏滤器对于从偏滤器区域注入Ar杂质的屏蔽效果优于从主等离子体区域注入,并且下偏滤器及内冷泵的综合粒子排除能力优于上偏滤器。Divertor impurity injection on Tokamak is the most important means to achieve divertor impurity screening efficiency . In this paper ,a fast-response extreme-ultraviolet （EUV） spectrometer is used to monitor the Ar emission lines during the EAST （Experimental Advanced Superconducting Tokamak ）divertor Ar injection experiment .Based on the NIST （National Institute of Standards and Technology ）atomic spectrum database ,the emission lines from different ionized Ar ions in 2~50 nm wavelength range ,e .g .Ar Ⅳ ,Ar Ⅳ-Ⅺ and Ar Ⅹ Ⅳ-Ⅹ Ⅵ ,are being identified .Ar Ⅹ Ⅵ 35.39 nm and Ar Ⅳ 44.22 nm with the ionization energy of 918.4 and 59.6 eV respectively are being monitored during the experiment with Ar puffing to observe the behavior of Ar impurities in different regions in plasmasimultaneously .The preliminary analysis on divertor impurity screening efficiency is carried outwith the time evolution of intensities of two Ar emission lines .The results of experiment puffing from the same gas puffing inlet （e .g .from lower outer target inlet ） and withdifferent plasma configurations （e .g .lower single null ,upper single null） show that the screening effect on the impurity injected from the divertor region is better thanfrom the main plasma region ;the screening effect of lower divertor and particle pumping by internal cryopump installed in lower divertor is stronger than upper divertor .

关 键 词：Ar极紫外光谱 EAST托克马克 偏滤器 杂质屏蔽 

分 类 号：O657.3[理学—分析化学]