基于Comsol的双环磁控溅射靶的磁场模拟分析  

Simulation Analysis of Magnetic Field of Two-rings Magnetron Sputtering Target by Comsol

作　　者：薛莹洁 陈海峰[1] 

机构地区：[1]陕西科技大学机电工程学院,西安710021

出　　处：《人工晶体学报》2016年第6期1696-1702,共7页Journal of Synthetic Crystals

摘　　要：影响靶材刻蚀特性的主要因素来自平行靶面的磁场分布,为了得到更优的磁控靶结构参数以实现靶面水平磁感应强度的均匀分布,本文利用Comsol软件对双环磁控溅射靶的靶面水平磁感应强度分布进行模拟分析,得出了当内磁环高度h=10 mm,外磁环与靶材间距d=7 mm时的靶面水平磁感应强度分布较为理想。除此之外,还探讨了加装导磁片对靶面水平磁感应强度的影响,结果表明采用适当的导磁片长度、厚度以及导磁片与磁环之间的间距,对靶材的水平磁场强度分布具有调节作用。在工程应用中,技术人员可以事先对靶材结构进行模拟优化以节省生产周期和成本,对实际生产具有指导意义。The horizontal distribution of magnetic greatly influence the etching morphology of target. So,in order to get a better structural parameters to make the distribution of magnetic flux density more uniform,comsol software was used to simulate the surface of a two-rings magnetron sputtering target of its magnetic flux density to optimize the structural parameters of the target,and the results show that when the height of inner magnet is 10 mm,the distance between the outer magnet and target is 7 mm,the horizontal distribution of magnetic is the most uniform. Besides,the influence of the FSS（ ferromagnetic shunt shim） were still simulated in this article,by taking the proper thickness,length and the distance between target and magnet,the FSS can significantly improve the uniformity of the gorizontal magnetic flux density distribution. During the application of the practical engineering,the relevant technical staff can use computer to optimize the structure of the target in advance,in order to save the production cycle and cost,which have the instruction meaning to the actual production.

关 键 词：双环磁控溅射靶 Comsol模拟 水平磁感应强度 结构参数 

分 类 号：TM27[一般工业技术—材料科学与工程]