超声雾化-ICP-AES测定高纯金属铜中痕量杂质元素  

Determination of trace elements in metal copper of high purity by ICP-AES with ultrasonic nebulization

作　　者：周世萍[1] 朱光辉[1] 尹家元[1] 荣惠锋[1] 

机构地区：[1]云南大学化学系,云南昆明650091

出　　处：《冶金分析》2002年第4期13-15,共3页Metallurgical Analysis

摘　　要：研究了超声雾化 -ICP AES测定高纯金属铜中 10种痕量杂质元素的方法。采用离峰扣背景与基体匹配相结合的方法消除基体干扰 ,对实验条件进行了优化。试验结果表明 :回收率为 95 %～ 10 5 % ,RSD均小于 3 %。The method for the determination of 10 trace elements in metal copper of high purity by ICP AES with ultrasonic nebulization was studied The interference of copper matrix and the effect of the matrix concentration on the determined elements were investigated The optimal working condition, the analytical spectral lines and matrix concentration were examined Results obtained for the determination of 10 trace elements in high purity copper were satisfactory The RSDs were less than 3%,and the recoveries were about 95%-103%

关 键 词：超声雾化 ICP-AES 测定 高纯金属铜 痕量杂质元素 电感耦合等离子体发射光谱法 

分 类 号：TG115.3[金属学及工艺—物理冶金]