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出 处:《冶金分析》2002年第4期47-48,52,共3页Metallurgical Analysis
摘 要:应用电感耦合等离子体发射光谱方法测定了硅铬合金中铝和锰。用基体匹配法消除基体干扰和钇内标元素校正溶液进样的物理化学干扰 ;讨论了基体中共存元素的影响、分析谱线的选择和测量的最佳酸度条件 ;经方法的准确度和精密度试验 。Al and Mn in chromium silicon alloy were simultaneously determined by ICP AES in this paper.Chromium was added mating with the amount of chromium matrix to eliminate matrix effects and yttrium was as the element of internal standard to correct physical and chemical interferences caused by sampling The interference of coexisting elements,analytical line and the optimal condition for determination were discussed Satisfactory results were obtained
关 键 词:ICP-AES 测定 电感耦合等离子体发射光谱 硅铬合金 铝 锰 冶金
分 类 号:TG115.3[金属学及工艺—物理冶金]
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