镍基合金基体上离子镀TiN薄膜的制备及性能  

Preparation and properties of Ti N films by ion plating on the nickel-base alloy

作　　者：陈舒恬[1,2] 甘斌[3] 王珏[2] 皮锦红[2] 

机构地区：[1]江苏省先进结构材料与应用技术重点实验室(南京工程学院),南京211167 [2]南京工程学院材料工程学院,南京211167 [3]西北工业大学材料学院,西安710072

出　　处：《材料科学与工艺》2016年第4期82-86,共5页Materials Science and Technology

基　　金：江苏省自然科学基金青年基金(BK20150729);南京工程学院引进人才科研启动基金(YKJ201306)

摘　　要：在镍基合金Inconel 740H基底上通过多弧离子镀制备Ti N薄膜.控制温度、气体流量、过渡层成分等重要参数,研究其对Ti N薄膜的表面形貌、力学性能以及耐腐蚀性的影响.多弧离子镀沉积过程中,沉积温度分别为200、250、300℃;过渡层成分分别为Al、Cr、Ti;气体流量分别为Ar 5 Sccm∶N240 Sccm,Ar 6 Sccm∶N248 Sccm,Ar 8 Sccm∶N264 Sccm.实验结果表明:在本实验的温度范围内,Ti N薄膜的致密度、结合力以及表面硬度均随着沉积温度的提高而提高;Cr作为过渡层的效果优于Al和Ti,薄膜成分均匀、表面致密,硬度更高,且耐腐蚀性能优异;在Ar、N2流量比一定的情况下,气体流量对Ti N薄膜的表面形貌和力学性能影响不大.本实验的最佳参数是:沉积温度300℃,过渡层成分为Cr,气体流量为Ar 6 Sccm、N248 Sccm.The TiN films were prepared by ion plating on the nickel-base alloy Inconel 740 H.The effect of the temperature,gas flow rate,and the compositions of transition layers on the surface morphology,mechanical properties and corrosion resistance of Ti N films was studied.The deposition temperature was 200 ℃,250 ℃ and300 ℃,and the transition layer was Al,Cr,and Ti,respectively.With the substrate temperature increase,the density,binding force and surface hardness of the TiN films were improved.Gas flow rates were 5 Sccm Ar /40 Sccm N2,6 Sccm Ar/ 48 Sccm N2,8 Sccm Ar/ 64 Sccm N2,respectively.The results show that the density,bond strength and surface hardness of Ti N films were increased by the deposition temperature; Cr as transition layer is better than that of Al and Ti in the aspects of uniform film composition,surface density,high hardness,and resistance to corrosion resistance is excellent.Gas flow rate has little effect on the surface morphology and mechanical properties of Ti N thin films in the case of Ar and N2 flux ratio.The best parameters of this experiment are：deposition temperature 300 ℃,the transition layer composition is Cr,gas flow rate is Ar 6 Sccm,N248 Sccm.

关 键 词：表面处理 Ti N薄膜 离子镀 纳米压痕 镍基合金 

分 类 号：TG178[金属学及工艺—金属表面处理]