反式二丁烯与氢气流量比对辉光放电等离子体组分与聚合物薄膜表面粗糙度的影响  

Effect of Flow Ratio of T_2B/H_2 on Glow Discharge Plasma Composition and Surface Roughness of Polymer Thin Film

作　　者：陈果[1] 张玲[1] 何小珊[1] 何智兵[1] 唐永建[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《原子能科学技术》2016年第9期1658-1663,共6页Atomic Energy Science and Technology

摘　　要：采用低压等离子体增强化学气相沉积方法(LPPE-CVD),以反式二丁烯(T_2B)和氢气(H_2)为工作气体,改变T_2B/H_2流量比制备不同条件下的碳氢聚合物(GDP)薄膜。利用质谱诊断技术研究了工作气体流量比对薄膜沉积过程中等离子体组分及离化程度的影响规律。同时结合白光干涉和SEM等技术研究了GDP薄膜的表面粗糙度和表面形貌的变化规律。结果表明,随T_2B/H_2流量比的增加,反应腔室中等离子体的离化率呈现先增大后减小的趋势。当T_2B/H_2流量比为0.8∶10时,反应气体的裂解程度最大,等离子体中离子片段的总量也最多。薄膜的表面粗糙度随T_2B/H_2流量比的增加出现先减小后增大的趋势。在0.6∶10的T_2B/H_2流量比条件下,薄膜的均方根粗糙度Rq达到极小值39.1nm。Using trans-two butylene（T_2B）and hydrogen（H_2）as the work gas,the glow discharge polymer（GDP）thin film was obtained at various flow ratios of T_2B/H_2 by low pressure plasma enhanced chemical vapor deposition（LPPE-CVD）. The dependence of plasma composition and ionization ratio on the flow ratio of T_2B/H_2 during the deposition of film was investigated using mass spectrometer.As well as,white-light interferometer（WLI）and scanning electron microscope（SEM） were employed to determine the dependence of the surface roughness and surface morphology of GDP thin film on the flow ratio of T_2B/H_2.The results show that the ionization ratio of plasma increases at first and then decreases with increase of the T_2B/H_2 flow ratio.At the T_2B/H_2 flow ratio of 0.8∶10,the dissociation degree of precursor and the number of ion fragment reach the maximum.With the increase of the T_2B/H_2 flowratio,the surface roughness decreases at first and then increases.At the T_2B/H_2 flow ratio of 0.6∶10,the surface root-mean-square roughness Rqreaches the minimum of 39.1nm.

关 键 词：GDP薄膜 表面粗糙度 流量比 等离子体组分 

分 类 号：O484[理学—固体物理]