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作 者:吴霜[1] 刘波[1] 陈士伟[1] 张娟楠[1] 刘小林[1] 顾牡[1] 黄世明[1] 倪晨[1] 薛超凡[2]
机构地区:[1]同济大学上海市特殊人工微结构材料与技术重点实验室,物理科学与工程学院,上海200092 [2]中国科学院上海应用物理研究所,上海201204
出 处:《无机材料学报》2016年第9期948-954,共7页Journal of Inorganic Materials
基 金:国家自然科学基金(11574230,11374229)~~
摘 要:Lu_2SiO_5:Ce^(3+)薄膜具有高光产额、快衰减时间、高密度、高空间分辨率等优点,有望成为X射线探测中的闪烁材料,但制备高质量的薄膜面临挑战。本工作采用溶胶凝–胶法,通过对制备过程中水硅比、烧结程序、胶黏剂和固含量等四个因素的系统研究与分析,结果表明:在空气湿度为85%,溶胶水硅比为6.6条件下,适量添加PEG400,采用优化后最佳固含量,从450℃开始进行烧结程序后退火,可制备出具有透明、平整、无裂痕的高质量Lu_2SiO_5:Ce^(3+)闪烁薄膜,单次旋涂获得的膜厚达到167 nm。实验表明水含量是引起薄膜发白的主要因素;烧结程序决定了薄膜的有机物分解程度及结晶状况;溶胶固含量及胶黏剂含量是调控薄膜厚度的重要方法。本工作为Lu_2SiO_5:Ce^(3+)闪烁薄膜的实际应用奠定了基础。Lu2SiO5: Ce^3+ thin film is a promising material for X-ray detection due to its high light output, short decay time, high density, and high spatial resolution. In present work, Lu2SiO5: Ce^3+ thin films were prepared by Sol-Gel method. The optimal experimental conditions were obtained concerning solid content, adhesive content, water content, and annealing progress. Under the conditions with air humidity of 85%, sol's H2O-Si ratio of 6.6, appropriate amount of PEG400, optimized solid content, and sintering starting from 450℃, the thin films are prepared crack-free with high transparence and excellent luminescent properties. The thickness of its single layer is 167 nm. It is found that water content is the major factor that causes film foggy, and sintering progress affects the reaction of organics and crystallization. Furthermore, solid content and the adhesive content are the two factors controlling the film thickness. The present study may promote the application of Lu2SiO5: Ce^3+ thin films in detection systems.
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