N80表面膜结构的XPS定量分析  

Quantitative Analysis of N80 Surface Film Structure with X-ray Photoelectron Spectroscopy

作　　者：王甜甜[1] 王祯[1] 王赟[1] 胡军[1] 

机构地区：[1]西北大学化工学院

出　　处：《化工机械》2016年第5期597-601,共5页Chemical Engineering & Machinery

基　　金：国家自然科学基金项目(51301132);中国博士后基金项目(2014M550507;2015T81046);陕西省教育厅专项基金项目(14JK1751);陕西省工业攻关项目(2014K08-28)

摘　　要：利用X射线光电子能谱仪分析研究了N80在不同配比的腐蚀溶液中形成膜的表面、一定深度的元素含量变化和缓蚀剂在N80表面作用的缓蚀机理。实验结果表明：曼尼希碱溶液与钨酸钠溶液复配使用，在N80表面形成了更致密的膜结构，能有效地减缓N80的腐蚀；且当钨酸钠浓度为0．0002mol／L，曼尼希碱浓度在0．0002～0．0200mol／L之间变化，配比为1：0．01时，N80表面C元素含量最多，N元素结合能最大，膜的厚度最厚，结构最稳定，缓蚀效率最好。X-ray photoelectron spectroscopy（XPS） was used to analytically investigate the N80＇s surface film formed in the corrosive solution of different proportion and the element content＇ s change in a certain depth as well as the inhibition mechanism of corrosion inhibitor on N80＇ s surface. The experimental results show that, the Mannich base mixed with sodium tungstate solution can produce more compact film on the N80＇ s surface to retard any corrosion there; and when the concentration of sodium tungstate solution stays at 0. 000 2mol/L, that of Mannich base can range from 0. 000 2 to 0. 020 0mol/L; for a 1：0.01 solution proportion, the C ele- ment content on the N80＇ s surface becomes largest and the N element＇ s binding energy is the maximum to- gether with the thickest inhibitive film and the most stable structure as well as the highest inhibition efficiency.

关 键 词：XPS 缓蚀剂 复配 结合能 

分 类 号：TG174.3[金属学及工艺—金属表面处理]