等离子体离子源磁场分布数值计算  

Simulation of plasma ion source magnetic-field distribution

作　　者：任春生[1] 牟宗信[1] 李国卿[1] 钟溥[1] 

机构地区：[1]大连理工大学三束材料表面改性国家重点实验室,辽宁大连116024

出　　处：《大连理工大学学报》2002年第4期396-399,共4页Journal of Dalian University of Technology

摘　　要：在离子源的设计中 ,为了减少等离子体的器壁复合损失 ,经常采用磁场对等离子体进行约束 ;但磁场分布的复杂性 ,给实际测量带来了困难 .介绍采用磁荷法对低能辐照离子源中磁场分布进行计算 ,给出了计算结果 ,并讨论了误差可能产生的原因及其影响 .计算结果对于离子源设计中的阴极热电子发射、离子束有效引出面积确定及等离子体的有效约束等重要问题有一定参考价值 .In the design of ion source, for the purpose of reducing plasma loss due to the recombination of electron and ion on discharge chamber wall, a magnetic field is usually used to confine the discharge plasma. Because of the complication of magnetic field distribution, actual measurement of magnetic field distribution is very difficult. This paper introduces the method and results of the numerical simulation of the magnetic field distribution of a low energy irradiation ion source. The reasons and effects of the error caused by the simulation have also been discussed. The simulation results have provided useful references for these problems such as thermal cathode primary electron emission, the determination of ion beam derivation area and the effective confinement of discharge plasma in the design of ion source.

关 键 词：等离子体 离子源 磁场分布 数值计算 磁约束 磁场位形 磁荷理论 离子束 

分 类 号：O532.11[理学—等离子体物理]