EAST等离子体放电真空室暴露大气后的真空恢复研究  

The study on vacuum recovery after the venting of EAST plasma vacuum vessel

作　　者：万朝 余耀伟[1] 胡建生[1] 龚先祖[1] WAN Zhao YU Yao-wei HU Jian-sheng GONG Xian-zu(Institute of Plasma Physics Chinese Academy of Sciences, Hefei 230031, China)

机构地区：[1]中国科学院等离子体物理研究所,安徽合肥230031

出　　处：《真空》2016年第5期1-3,共3页Vacuum

摘　　要：洁净的壁条件和良好的真空环境是托克马克装置运行的基本条件,但是真空室暴露大气后会在器壁表面吸附大量的杂质,如何快速恢复良好的真空环境以及壁条件是关系到托克马克运行效率和成本的一个关键问题。本文深入分析了EAST 2015年夏季实验期间真空室两次暴露大气后的壁处理对真空条件的恢复,结果显示水汽是真空室暴露大气后的主要杂质成分,直流辉光和离子回旋放电清洗与第一壁200℃烘烤同时进行能够有效地恢复真空。研究结果还发现暴露大气前的第一壁涂层处理会增强杂质的吸附,需要更长时间的壁处理才能够恢复较好的真空条件。Good vacuum environment and wall condition are general condition for the operation of the Tokomak device.However, the wall surface would adsorb various impurities when the vessel venting. The fast recovery of vacuum is a critical factor for the operation efficiency improvement and experimental costs decrease. The procedure of venting and the impurity removal by wall conditionings during the summer of 2015 were analyzed. The results show that water vapor is the major impurity adsorbed by the wall surface during the venting. Glow discharge cleaning, ion cyclotron radio frequency discharge cleaning and first wall baking of 200 ℃ are more efficient for impurity removal. Film coating conditioning before venting requires longer time to recover vacuum.

关 键 词：壁处理 直流辉光放电清洗 烘烤 托卡马克 

分 类 号：O461.2[理学—电子物理学]