High-reflectivity high-contrast grating focusing reflector on silicon-on-insulator wafer  

作　　者：房文敬 黄永清 段晓峰 刘凯 费嘉瑞 任晓敏 

机构地区：[1]Institute of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications [2]State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications

出　　处：《Chinese Physics B》2016年第11期306-310,共5页中国物理B（英文版）

基　　金：Project supported by the National Natural Science Foundation of China(Grant Nos.61274044,61574019 and 61020106007);the National Basic Research Program of China(Grant No.2010CB327600);the Specialized Research Fund for the Doctoral Program of Higher Education of China(Grant No.20130005130001);the Natural Science Foundation of Beijing,China(Grant No.4132069);the Key International Science and Technology Cooperation Project of China(Grant No.2011RR000100);the 111 Project of China(Grant No.B07005);the Program for Changjiang Scholars and Innovative Research Team in Universities of China(Grant No.IRT0609)

摘　　要：A high-contrast grating（HCG） focusing reflector providing phase front control of reflected light and high reflectivity is proposed and fabricated.Basic design rules to engineer this category of structures are given in detail.A 1550 nm TM polarized incident light of 11.86 mm in focal length and 0.8320 in reflectivity is obtained in experiment.The wavelength dependence of the fabricated HCGs from 1530 nm to 1580 nm is also tested.The test results show that the focal length is in the range of 11.81-12 mm,which is close to the designed focal length of 15 mm.The reflectivity is almost above 0.56 within a bandwidth of 50 nm.At a distance of 11.86 mm,the light is focused to a round spot with the highest concentration,which is much smaller than the size of the incident beam.The FWHM of the reflected light beam decreases to 120 nm,and the intensity increases to 1.18.A high-contrast grating（HCG） focusing reflector providing phase front control of reflected light and high reflectivity is proposed and fabricated.Basic design rules to engineer this category of structures are given in detail.A 1550 nm TM polarized incident light of 11.86 mm in focal length and 0.8320 in reflectivity is obtained in experiment.The wavelength dependence of the fabricated HCGs from 1530 nm to 1580 nm is also tested.The test results show that the focal length is in the range of 11.81-12 mm,which is close to the designed focal length of 15 mm.The reflectivity is almost above 0.56 within a bandwidth of 50 nm.At a distance of 11.86 mm,the light is focused to a round spot with the highest concentration,which is much smaller than the size of the incident beam.The FWHM of the reflected light beam decreases to 120 nm,and the intensity increases to 1.18.

关 键 词：reflector grating reflectivity wafer insulator focusing incident polarized length bandwidth 

分 类 号：TH74[机械工程—光学工程]