飞秒激光参数对硅表面微结构影响的研究  

Study of the effects of femtosecond laser peak power to silicon micro-structure

作　　者：罗坤[1,2] 陈向前[1,2] 彭滟[1,2] 朱亦鸣[1,2] 

机构地区：[1]上海理工大学上海市现代光学系统重点实验室,上海200093 [2]上海理工大学光电信息与计算机工程学院,上海200093

出　　处：《光学仪器》2016年第5期402-406,共5页Optical Instruments

基　　金：国家重大仪器专项(2011YQ150021;2012YQ15009205);上海市教育委员会上海市教育发展基金会"晨光计划"(12CG54)

摘　　要：为了制备出表面具有准规则排列的微米量级锥形尖峰结构的黑硅材料,在SF6气体氛围中,用一定能量密度的飞秒脉冲激光照射单晶硅片表面。针对激光通量和激光峰值功率这两个参量分别进行实验,具体分析了15fs和130fs脉冲宽度的飞秒激光脉冲作用下硅表面微结构的形成,不同实验条件下制备出的硅微纳结构也有明显的差异。研究表明,在同一背景气体下,激光的峰值功率对硅表面微结构的形成起着决定性的作用。The material black silicon formed by an array of sharp conical spikes on the silicon surface is fabricated under the cumulative femtosecond laser pulses irradiation.Experiments are designed with the different laser flux and peak power in SF6 ambient atmosphere.The formation of the silicon surface micro-structure under 15 fs and 130 fs femtosecond laser is analyzed in detail.There are obvious differences for silicon micro-structure under the different experimental conditions.The study found that the laser peak power plays a determinative effect in the formation of the silicon surface micro-structure in the certain ambient atmosphere.

关 键 词：表面微结构 黑硅 脉冲宽度 激光峰值功率 

分 类 号：TN248[电子电信—物理电子学]