硅氮薄膜的摩擦性能与其表面能的相关性  

Study on the correlation between surface energy andtribological property of silicon-nitride films

作　　者：石志锋[1] 黄楠[2] 王琳[1] 宁成云[1] 王迎军[1] 

机构地区：[1]华南理工大学国家人体组织功能重建工程技术研究中心,广州510640 [2]西南交通大学先进材料技术教育部重点实验室,成都610031

出　　处：《功能材料》2016年第12期12001-12006,共6页Journal of Functional Materials

基　　金：国家重点基础研究发展计划(973计划)资助项目(2012CB619100);国家自然科学基金联合基金资助项目(U0834003);广东省重大科技专项资助项目(2010A080407008)

摘　　要：采用非平衡磁控溅射沉积技术,在钴合金表面制备了一系列硅氮薄膜。借助接触角、原子力显微镜考察了离子轰击能量对硅氮薄膜表面形貌和能态的影响;并在不同的测试环境中对薄膜摩擦学性能进行了研究。结果表明,通过调整离子轰击能量,能影响薄膜的表面润湿性,改善薄膜的摩擦学性能。随基体负偏压的提高,色散分量对薄膜表面能的贡献提高,薄膜的亲水性提高;大气环境下,薄膜与SiC球的摩擦系数维持在0.4-0.6之间,湿环境下,薄膜的摩擦系数大幅下降,稳定在0.18左右。硅氮薄膜是一类具有两性分子特性的功能材料,表现出良好的湿环境摩擦学性能,是一类极具潜力的人工关节生物机械保护薄膜。A systematic study on the preparation and properties of silicon-nitride （Si-N）films under varying dif-ferent substrate bias voltage was carried out on the matrix of Co-Cr-Mo alloy by direct current unbalanced mag-netron sputtering techniques.With the increase in the substrate bias voltage from 50 to 200 V,the ratio of polar component and dispersion component of the films surface energy decreases from 0.5 to 0.25,the surface tension between solid surface of the Si-N films and water has increased rapidly.The films showed high hardness and e-lastic modulus at 100 V,while the state of samples between sputtering and the control for Si,Ar,and N plas-ma reached to equilibrium at 150 V to grow slow and dense.The lowest mean steady-state friction coefficient of 0.18 was obtained for the Si-N/SiC tribo-pair in FBS,and that in ambient air is approximately 0.5.The as-de-posited Si-N films are amphipathic nature,the Si-N films showed good tribological properties in wet environ-ment,and the friction coefficient fell sharply in fetal bovine serum.So it is a kind of potential water medium lu-brication of biological machinery membrane layer.

关 键 词：硅氮薄膜 磁控溅射 表面润湿性 摩擦性能 

分 类 号：TB43[一般工业技术]