PSⅡ金属圆管内表面改性中的多脉冲鞘层动力学研究  

Research on Multipulse Sheath Dynamics in the Inner Surface Modification of Metal Tube by Plasma Source Ion Implantation

作　　者：李义[1] 敬晓丹[1] 冯立强[1] 

机构地区：[1]辽宁工业大学理学院,辽宁锦州121001

出　　处：《辽宁工业大学学报（自然科学版）》2016年第6期351-355,360,共6页Journal of Liaoning University of Technology(Natural Science Edition)

基　　金：国家自然科学基金青年基金项目(11504151);辽宁省教育厅科学研究一般项目(2015233);辽宁工业大学教师科研启动基金(201320)

摘　　要：通过低压非稳态扩散流体模型和鞘层碰撞流体模型数值模拟了等离子体源离子注入(PSII)金属圆管内表面改性过程中的多脉冲鞘层动力学行为,研究了等离子体的扩散行为和脉冲特性对离子注入过程的影响。模拟结果显示,工作气压越低等离子体扩散越迅速,0.1 Pa以下还会出现明显的恢复过冲现象。脉冲的占空比较高时,管内壁附近的等离子体来不及恢复到初始状态,从而降低了注入离子流的峰值,但却增大了注入离子流的平均值,平均注入离子流几乎随占空比线性增加。The non-steady diffusion fluid model and the collision fluid model under low pressure are used to simulate the dynamic behaviors of multipulse sheath in the inner surface modification of a metal tube by plasma source ion implantation. The behaviors of plasma diffusion and the influences of the pulse character on the process of ion implantation are researched. The simulation results show that the plasma can diffuse rapidly under the low pressure, even the overshoot phenomenon of the plasma recovery appears under 0.1 Pa obviously. When the duty cycle of the pulse is high, the plasma near the inner surface of the tube can not recover to the initial state at the beginning of the next pulse, the peak value of the implanted ion current decreases consequently. But the average value of the implanted ion current increases, the average implanted ion current almost increases with the duty cycle linear.

关 键 词：等离子体源离子注入 等离子体扩散 内表面改性 流体模型 模拟 

分 类 号：O539[理学—等离子体物理] TL612[理学—物理]