铁基高温合金GH2132的离子渗氮层组织  

Microstructure of plasma nitrided layer of Fe-based GH2132 superalloy

作　　者：侯彩云[1] 许晓磊[1] 于志伟[1] Hou Caiyun Xu Xiaolei Yu Zhiwei(School of Transportation Equipment and Marine Engineering, Dalian Maritime University, Dalian Liaoning 116026, China)

机构地区：[1]大连海事大学交通运输装备与海洋工程学院,辽宁大连116026

出　　处：《金属热处理》2016年第12期10-13,共4页Heat Treatment of Metals

摘　　要：对铁基高温合金GH2132进行450℃低温等离子体渗氮。利用扫描电子显微镜、X射线衍射技术分析研究渗氮层组织结构特点。结果表明:渗氮层由高硬度且耐蚀性更好的奥氏体基过饱和氮固溶体,即膨胀奥氏体γ_N相组成。γ_N相的点阵参数由表及里沿渗层深度逐渐降低,且点阵膨胀相对于基体奥氏体呈各向异性。渗层厚度约23μm,呈双渗层结构,即形成了内扩散层。The Fe-based GH2132 superalloy was low temperature plasma-nitrided at 450 ℃. Microstructure of nitrided layer was investigated by scanning electron microscopy （SEM） and X-ray diffraction （XRD）. The test results show that the microstructure of nitrided layer is mainly composed of the supersaturated solid solution of nitrogen in austenite with high hardness and better corrosion resistance, namely expanded austenite （γN ）. The lattice parameter of ＂YN phase from the outside to the inside of nitrided layer decreases gradually along the depth, and the lattice expansion with respect to austenite matrix is anisotropic. The thickness of nitrided layer is about 23μm, that present double-layer microstructure, which is formed inner diffusion layer.

关 键 词：铁基高温合金GH2132 等离子体渗氮 渗氮层 膨胀奥氏体γ_N 

分 类 号：TG156.82[金属学及工艺—热处理]