CVD法制备ZrC涂层与ZrC-TaC共沉积涂层的烧蚀性能  

Ablation properties of ZrC coating and ZrC-TaC co-deposition coating Fabricated by CVD

作　　者：宋永忠[1] 李国栋[2] 程家[1] 吴敏[2] 李兴超[1] 樊桢[1] 冯志海[1,2] 

机构地区：[1]航天材料及工艺研究所先进功能复合材料技术重点实验室,北京100076 [2]中南大学粉末冶金国家重点实验室,长沙410083

出　　处：《粉末冶金材料科学与工程》2016年第6期952-960,共9页Materials Science and Engineering of Powder Metallurgy

基　　金：国家重点基础研究发展计划资助项目(2011CB605805)

摘　　要：采用ZrCl_4-CH_4-H2-Ar与ZrCl_4-TaCl_5-CH_4-H_2-Ar反应体系,用化学气相沉积(CVD)制备ZrC涂层与ZrC-TaC共沉积涂层,并对其进行氧-乙炔焰烧蚀试验研究。利用X射线衍射(XRD)和扫描电镜(SEM)等分析技术对烧蚀前后ZrC与ZrC-TaC共沉积涂层的相组成及微观结构进行表征,并分析2种涂层的烧蚀机理。结果表明:ZrC涂层为细柱状晶体组织,ZrC-TaC共沉积涂层为ZrC与TaC成分周期性波动自组装多层复合结构,具有良好的组织结构可控性。经过60s氧-乙炔焰烧蚀试验,ZrC-TaC复相涂层表现出良好的抗热震性和整体完整性,与基体连接良好,无剥蚀和脱落,烧蚀性能明显优于单一ZrC涂层的烧蚀性能。ZrC-TaC复合涂层线烧蚀率和质量烧蚀率分别为5.3×10-5mm/s和3.2×10-5g/s,表现出良好的抗烧蚀性能。ZrC and ZrC-TaC coatings were deposited by chemical vapor deposition （CVD） using a gas mixture of ZrCl4, TaCl5, H2, CH4 and Ar. The microstructure and ablation properties of ZrC and ZrC-TaC coatings were characterized by X-ray diffraction, scanning electron microscopy and oxyacetylene torch ablation test. The ablation mechanism of the coatings was also investigated. The results show that the as-prepared coating is biphasic coating consisting of ZrC and TaC. The coating structure can be controlled by adjusting the deposition processing and the deposited coating exhibits multilayered-structure with columnar-crystal layer inserting between two particle-stacked layers. During ablation, the co-deposition coating exhibits outstanding configurational stability and good adhesion to substrate. After ablation for 60 s, the mass and linear ablation rates of the coated sample are 3.2×10^-5g/s and 5.3×10^-5mm/s, respectively, indicating that the coating has excellent ablation resistance properties.

关 键 词：共沉积 ZrC涂层 ZrC-TaC涂层 烧蚀性能 CVD 

分 类 号：TQ174.758.16[化学工程—陶瓷工业]