基于FIB-SEM双束系统的纳尺度真空间隙电学特性原位实验装置  

In situ experimental set-up for probing electrical characteristics of nanoscale vacuum gaps based on the FIB-SEM dual-beam system

作　　者：孟国栋[1] 董承业 门闯[1] 成永红[1] 

机构地区：[1]西安交通大学电气工程学院,陕西西安710049

出　　处：《电子显微学报》2016年第6期526-532,共7页Journal of Chinese Electron Microscopy Society

基　　金：国家自然科学基金资助项目(No.51607138);强脉冲辐射环境模拟与效应国家重点实验室专项经费(No.SKLIPR.1512)

摘　　要：纳米尺度真空电气击穿与绝缘特性研究是高电压与绝缘技术领域的前沿课题。一方面,随着微纳尺度加工技术的不断发展,电气部件和电子器件的特征物理尺寸已经逐步降低到微米、纳米甚至是分子原子尺度,并且在军事和民用领域得到越来越广泛的应用;另一方面,传统的放电击穿理论和绝缘性能评价方法无法用来解释和预估微纳尺度的放电特性和绝缘水平。因此,本文基于聚焦离子束和扫描电子显微镜(FIB-SEM)双束系统,借助纳米压电位移技术和微弱电流测量技术,建立了纳尺度真空间隙电学特性的原位研究系统。该系统不仅能够进行微纳尺度(曲率半径为15 nm^10μm)金属电极的原位加工,材料组成成分的定量分析,而且可以实现纳尺度真空间隙(>20 nm)的放电特性研究,为纳尺度击穿规律和绝缘特性的实验研究提供了有力的支撑。The research on the breakdown characteristics and insulation properties at nanoscale is on the cutting edge of the high voltage and insulation field. On the one hand,the feature size of the electrical component and electronic devices has been scaled down to micrometer,nanometer and even atomic size as the rapid development of micromachining technique,which has extensive applications in military and civil fields. On the other hand,the explanation and prediction for the breakdown and insulation properties at micro and nanoscale can not be performed through the classic breakdown theory and assessment method. Hence,based on the FIB-SEM dualbeam system,an in situ experimental system for nanoscale gap breakdown in vacuum by the piezoelectric displacement and the weak current measurement techniques has been set up. Using this system,the in situ fabrication of micro and nanoscale（with the radius from 15 nm to 10 μm） electrodes,quantitative analysis of material compositions as well as the experimental investigation on the breakdown chrematistics of nanoscale vacuum gap can be achieved. The study is believed to pave the way to the experimental study of breakdown characteristics and insulation properties at nanoscale.

关 键 词：FIB-SEM双束系统 纳尺度真空间隙 电气击穿 原位研究 

分 类 号：TM85[电气工程—高电压与绝缘技术] TB383.1[一般工业技术—材料科学与工程]