反应离子束刻蚀石英同质掩模制作小阶梯光栅  

Fabrication of echelette gratings by reactive ion beam etching of native substrate grating mask

作　　者：董圣为 邱克强[1] 付绍军[1] DONG Sheng-wei QIU Ke-qiang FU Shao-jun(National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230009, Chin)

机构地区：[1]中国科学技术大学国家同步辐射实验室,安徽合肥230029

出　　处：《真空》2016年第6期54-58,共5页Vacuum

摘　　要：离子束刻蚀作为真空技术的一种重要应用,已广泛运用于现代微电子器件和微光学器件的制作工艺中。本文结合反应离子束刻蚀与全息光刻技术,针对线密度较低的小阶梯光栅,倾斜刻蚀石英同质掩模,制作了三种在紫外光和可见光波段透射闪耀的小阶梯光栅。第一种光栅线密度为360lp/mm,闪耀角16.8°,在325nm波长的透射衍射效率为74%;第二种和第三种光栅线密度均为400lp/mm,闪耀角为34.7°和43°,其在632.8nm波长的透射衍射效率分别为63%和57%。结果表明,使用CHF_3作为刻蚀气体的反应离子束刻蚀石英同质掩模,所制作的小阶梯光栅在其工作波段透射闪耀的衍射效率为理论值的75%以上,为全息离子束制作低线密度大闪耀角的光栅提供参考。As an important application of vacuum technology, ion beam etching is widely used in the fabrication of microelectronic devices and micro optical devices. To explore an efficient method to fabricate echelette gratings with low line densities, three kinds of echelette gratings with good transmission blazing effects at the wavelengths of visible light and UV light were fabricated by combining holographic lithograph and reactive ion beam etching of native substrate grating mask. The first kind of gratings with a line density of 360lp/mm and a blaze angle of 16.8° showed a transmission diffraction efficiency of 74% at 325nm. Similarly,for the others with the same line density of 400lp/mm but the different blaze angles of 34.7°and 43°, their efficiencies were about 63% and 57% at 632.8nm,respectively. The results show that the efficiencies of as-fabricated gratings are 75% higher than the theoretical values mostly, which could provide a good reference for the fabrication of gratings with larger periods and blaze angles.

关 键 词：小阶梯光栅 反应离子束刻蚀 闪耀角 衍射效率 

分 类 号：TB741[一般工业技术—材料科学与工程] TB79[一般工业技术—真空技术]