光伏及LED行业用特种钼制品研究现状  

RESEARCH STATUS OF SPECIAL MOLYBDENUM PRODUCTS USED IN PHOTOVOLTAIC AND LED INDUSTRY

作　　者：梁静[1] 

机构地区：[1]西北有色金属研究院,陕西西安710016

出　　处：《中国钼业》2016年第6期1-3,共3页China Molybdenum Industry

摘　　要：钼溅射靶材以溅射薄膜方式被消耗,钼合金薄膜是目前信息存储、集成电路芯片、特别是平板显示器、薄膜太阳能电池、蓝宝石制造等行业中必不可少的关键材料。这些行业中用的特殊钼制品主要有钼溅射靶材,包括平面靶和管状旋转靶,制作结晶蓝宝石用的钼坩埚等。随着平面显示器面板（LCD）生产线不断向大型化发展,对平面溅射板靶的尺寸要求也越来越大。管状溅射靶材利用率理论上可达70%,大大高于平面靶20%-30%的利用率,因此降低了镀膜生产成本,是靶材发展的方向。大口径薄壁钼坩埚是蓝宝石晶体生长炉中常用的耗材,可大大降低电耗,节能效果明显,近年来得到了各厂商广泛使用。Molybdenum alloy thin film is the key material in the information storage,integrated circuit chip,especially flat panel display,thin film solar cell and sapphire manufacture.Special molybdenum products used in these industries are mainly molybdenum sputtering target,including the flat target and tubular rotating target,the production of crystalline sapphire molybdenum crucible used.With the flat panel display（LCD） production lines continue to large-scale development,the target size of the plane sputtering target is also growing.The utilization rate of the tubular sputtering target can reach 70%theoretically,which is 20%-30%higher than that of the planar target,thus reducing the coating production cost and being the development direction of the target.Large diameter thinwalled molybdenum crucible is sapphire crystal growth furnace in the commonly used supplies,can greatly reduce power consumption,energy-saving effect is obvious.In recent years,it has been widely used by manufacturers.

关 键 词：钼溅射靶 钼管靶 旋压钼坩埚 

分 类 号：TG146.412[一般工业技术—材料科学与工程]