哈氏合金电化学抛光工艺的研究  

Study on Electropolishing of Hastelloy C-276 Alloy

作　　者：王毅[1] 王盼[1] 索红莉[1] 贾强[1] 卢东琪[1] 李怀洲[2] 吴海明[1] 

机构地区：[1]北京工业大学材料科学与工程学院,新型功能材料教育部重点实验室,北京100124 [2]首都航天机械公司,北京100076

出　　处：《材料导报》2017年第2期37-40,共4页Materials Reports

基　　金：国家自然科学基金(51571002);国家青年科学基金(51401003);京津冀合作青年基金

摘　　要：采用环保型抛光液对离子束辅助沉积技术路线用哈氏合金HastelloyC-276基带进行了电化学抛光,获得了典型的阳极极化曲线,并阐述了电化学抛光的机理。研究了影响电化学抛光的因素(电解液温度、抛光时间、抛光极距)对基带表面粗糙度的影响,优化工艺参数获得了表面粗糙度Ra<5nm(5μm×5μm)的高质量表面,满足后续生长过渡层对哈氏合金基带的要求。抛光液中的柠檬酸在50℃左右分解成络合剂,可迅速沉淀金属离子,提高表面的活性。The environmental friendly polishing liquid was used to polish the surface of Hastelloy C-276 alloy substrate, which was used for the technical route of ion beam assisted deposition （IBAD）. The typical curve of anodic polarization was obtained, and the mechanism of electrochemical polishing was described. The effect of electrochemical polishing elements （such as electrolytic polis- hing temperature, polishing time and polishing distance） on the roughness of substrate＇s surface was investigated. The high quality surface with the roughness lower than 5 nm （in the area of 5 tim）〈 5/~m） was obtained via the optimized polishing processes, which satisfied to the requirements of surface roughness for the subsequent deposition by IBAD. Citric acid in polishing liquid decomposed into a eomplexing agent at about 50 ℃, which could accelerate the precipitation of metal ions and increase the reactivity of surface.

关 键 词：表面粗糙度 哈氏合金 电化学抛光 原子力显微镜 

分 类 号：TM26[一般工业技术—材料科学与工程]