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作 者:SUN YongFeng CHAI ZhiMin LU XinChun HE DanNong SUN YongFeng CHAI ZhiMin LU XinChun HE DanNong(State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China;National Engineering Research Center for Nanotechnology, Shanghai 200241, China)
出 处:《Science China(Technological Sciences)》2017年第1期51-57,共7页中国科学(技术科学英文版)
基 金:supported by the National Natural Science Fundation of China(Grant Nos.50825501,51321092&51335005);the National Science and Technology Major Project(Grant No.2008ZX02104-001)
摘 要:We describe a direct atomic layer deposition method to grow lubricant tungsten disulfide (WS2) films. The WS2 films were deposited on a Si (100) substrate and a zinc sulfide (ZnS) film coated the Si (100) substrate using tungsten hexacarbonyl and hydrogen sulfide as precursors. The ZnS film served as an intermediate layer to facilitate the nucleation and growth of the WS2 films. The thickness of the WS2 films was measured via scanning electron microscope, the microstructure was probed with an X-ray diffractometer and a transmission electron microscope. The friction coefficient was measured with a ball-on-disk tester under dry nitrogen. The results reveal that the WS2 films deposited on both substrates are N175 nm and have (002) and (101) crystal orientations. The WS2 film deposited on the ZnS coated Si substrate exhibits a stronger (002) orientation and a denser crystal structure than that deposited on the Si substrate. The WS2 films on both substrates have low friction coefficients. How- ever, due to the stronger (002) orientation and denser crystal structure, the friction coefficient of the WS2 film deposited on ZnS coated Si substrate is smaller with longer wear life.
关 键 词:atomic layer deposition tungsten disulfide crystal orientation FRICTION
分 类 号:TQ136.13[化学工程—无机化工] TB383.2[一般工业技术—材料科学与工程]
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