电磁防护可视材料及其制造工艺  

Electromagnetic Protection Visible Material and Production Process

作　　者：许晓丽[1] XU Xiao- li(Department of Electromagnetic Protection Material ＆ Device, No. 33 Institute of CETC,Taiyuan ,030032, Shanxi, Chin)

机构地区：[1]中国电子科技集团公司第33研究所电磁防护材料与器件事业部,山西太原030032

出　　处：《电子材料与电子技术》2016年第4期1-12,共12页Electronic Material & Electronic Technology

摘　　要：本文主要针对电磁防护可视材料的用途、类型、组成要素、重要指标及基本结构进行简要概述的基础上，重点对电磁防护可视材料中的镀膜工艺、干法合成工艺、湿法合成工艺等三种制备工艺分别进行了详细阐述。Main application, types, elements, important index and basic structure of electromagnetic visible material are briefly introduced, then, three types of manufacturing process of electromagnetic visible material are focused to discuss including coating process and synthetic process by dry and wet respectively.

关 键 词：电磁防护可视材料 制备工艺 磁控溅射(ITO) 干法合成工艺 湿法合成工艺 

分 类 号：TN07[电子电信—物理电子学]