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作 者:简小刚[1] 雷强[1] 张奎林[2] JIAN Xiaogang LEI Qiang ZHANG Kuilin(Tongji University, Shanghai 201804, China Sinopec Science and Technology Department, Beijing 100728, China)
机构地区:[1]同济大学,上海201804 [2]中石化科技部,北京100728
出 处:《金刚石与磨料磨具工程》2016年第6期15-19,24,共6页Diamond & Abrasives Engineering
基 金:国家自然科学基金资助(51275358);中央高校专项基金资助(20140750)
摘 要:采用热丝化学气相沉积法(chemical vapor deposition,CVD)制备金刚石薄膜时,对反应室温度场尤其是衬底温度的精确控制是沉积高质量CVD金刚石膜的主要难点之一。在现有HF–650热丝CVD设备的基础上进行优化研究,基于热反射原理,采用Fluent软件进行模拟仿真计算,据此提出了反应室温度场补偿装置,即:在热丝CVD设备基台表面与四周布置反射板。对改进后的设备进行试验对比分析。研究结果表明:利用温度场补偿装置使衬底温度波动从原本的9.3%缩小到3.0%,有效改善热丝CVD系统衬底温度场的均匀性,并通过试验测试得到验证。用该装置制备的金刚石薄膜中金刚石与石墨的拉曼峰强度比值I_D/I_G=4.33,说明金刚石成膜质量得到提高。In the process of the diamond coating deposition of hot filament chemical vapor deposition( HFCVD),the precise control of temperature distribution,especially the temperature of substrate is one of the main problems affect the quality of diamond film. The paper proposes a temperature compensating device to improve the temperature distribution based on HF–650. Arranging reflective plates on and surrounding the substrate improves the distribution of temperature by thermal reflection. Simulation by Fluent and test by improved device will be used to verify the improvement. It is shown that the compensating device can uniform the temperature distribution of HFCVD,reducing temperature fluctuate from 9. 3% to 3. 0%,which has been proved by practice. With the device,high quality diamond film that I_D/ I_G= 4. 33 has been prepared,which is positive for diamond deposition.
分 类 号:TQ164[化学工程—高温制品工业]
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