Moriere势与晶体摆动场辐射的弛豫行为  

Moriere Potential and Relaxation Behavior of Crystalline Undulator Radiation

作　　者：李广明[1] 

机构地区：[1]东莞理工学院计算机学院,广东东莞523808

出　　处：《半导体光电》2017年第1期70-74,共5页Semiconductor Optoelectronics

摘　　要：在经典力学框架内和偶极近似下,利用Moriere势把粒子运动方程化为了具有软硬弹簧特性的广义Duffing方程,利用平均法分析了系统在主共振线附近的运动行为;对系统的稳定性和弛豫行为进行了讨论,并导出了系统的临界参数。结果表明,系统的稳定性与参数有关,适当调节这些参数,系统的稳定性就可以得到保证。The motion equations of particles were reduced to the generalized Duffing equation with a soft spring characteristics in the framework of classical mechanics and dipole approximation by using Moriere potential.The motion behavior of the system in the vicinity of the main resonance was analyzed by the average method,and also the stability and relaxation behavior in the system were discussed,and the critical parameters of the system was derived.The results show that the stability of the system relates to its parameters,only by appropriately adjusting these parameters,the stability can be guaranteed in principle.

关 键 词：晶体摆动场辐射 Moriere势 平均法 稳定性 

分 类 号：O434.1[机械工程—光学工程]