大面积纳米压印揭开式脱模机理和规律  

Mechanism and Laws of Peel-off Demolding for Large-area Nanoimprint Lithography

作　　者：李延强[1] 兰红波[1] 

机构地区：[1]青岛理工大学纳米制造与纳光电子实验室,青岛266033

出　　处：《中国机械工程》2017年第4期470-477,共8页China Mechanical Engineering

基　　金：国家自然科学基金资助项目(91023023;51375250);青岛市创业创新领军人才计划资助项目(13-CX-18)

摘　　要：针对大面积纳米压印脱模工艺,开展了揭开式脱模机理和规律的研究。基于界面黏附能理论,建立了气体辅助揭开式脱模力预估模型;基于应变能法和脱模过程中能量守恒定律,建立了气体辅助揭开式脱模临界脱模速度模型。利用ABAQUS工程数值模拟软件,分析得到纳米压印工艺参数(脱模力、脱模角度、脱模速度)对揭开式脱模的影响规律。This paper investigated the mechanism and influencing factors of peel demolding for large-area nanoimprint lithography.A model estimating the air pressure-assisted peel-off demolding forces was established based on the interfacial adhesion energy.A model of predicting the critical speed of air pressure-assisted peel-off demolding was derived by the combination of the strain energy method and the conservation of energy in demolding stage.Furthermore,the influences and laws of the demolding process parameters（demolding force,demolding angle,demolding speed）were revealed by numerical simulation using ABAQUS software.

关 键 词：大面积纳米压印 揭开式脱模 脱模力 脱模速度 

分 类 号：TN305[电子电信—物理电子学]