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作 者:代盼 卢建娅 谭明 王青松 吴渊渊 季莲 边历峰 陆书龙 杨辉
出 处:《Chinese Physics B》2017年第3期495-499,共5页中国物理B(英文版)
基 金:Project supported by the National Natural Science Foundation of China(Grant Nos.61534008,61376081,and 61404157);the Application Foundation of Suzhou,China(Grant No.SYG201437)
摘 要:The application of transparent conducting indium-tin-oxide (ITO) film as full front electrode replacing the conven- tional bus-bar metal electrode in III-V compound GalnP solar cell was proposed. A high-quality, non-rectifying contact between ITO and 10 nm N+-GaAs contact layer was formed, which is benefiting from a high carrier concentration of the terrilium-doped N+-GaAs layer, up to 2×10^19 cm^-3. A good device performance of the GalnP solar cell with the ITO electrode was observed. This result indicates a great potential of transparent conducting films in the future fabrication of larger area flexible III-V solar cell.The application of transparent conducting indium-tin-oxide (ITO) film as full front electrode replacing the conven- tional bus-bar metal electrode in III-V compound GalnP solar cell was proposed. A high-quality, non-rectifying contact between ITO and 10 nm N+-GaAs contact layer was formed, which is benefiting from a high carrier concentration of the terrilium-doped N+-GaAs layer, up to 2×10^19 cm^-3. A good device performance of the GalnP solar cell with the ITO electrode was observed. This result indicates a great potential of transparent conducting films in the future fabrication of larger area flexible III-V solar cell.
关 键 词:full indium-tin-oxide (ITO) electrode specific contact resistance solar cell
分 类 号:TM914.4[电气工程—电力电子与电力传动]
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