Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering  

作　　者：Hai-liang Huang 易国斌 Xi-hong Zu Ben-bin Zhong Hong-sheng Luo Hai-liang Huang;易国斌;Xi-hong Zu;Ben-bin Zhong;Hong-sheng Luo(School of Chemical Engineering and Light Industry, Guangdong University of Technology)

机构地区：[1]School of Chemical Engineering and Light Industry, Guangdong University of Technology

出　　处：《Chinese Journal of Polymer Science》2017年第5期623-630,共8页高分子科学（英文版）

基　　金：supported by the National Natural Science Foundation of China(Nos.51273048 and 51203025);Natural Science Foundation of Guangdong Province(No.S2012040007725)

摘　　要：In this paper, microphase behavior of an ABC triblock copolymer, polystyrene-block-poly（2-vinylpyridine）-block- poly（ethylene oxide）, namely PS-b-P2VP-b-PEO, was systematically studied during spin-coating and solvent vapor annealing based on various parameters, including the types of the solvent, spin speed and thickness. The morphological features and the microdomain location of the different blocks were characterized by atomic force microscope （AFM） and high resolution transmission electron microscopy （HRTEM）. With increasing thickness, the order-order transition from nanopores array to the pattern of nanostripes was observed due to microdomain coarsening. These processes of pattern transformation were based on the selectivity of toluene for different blocks and on the contact time between solvent molecules and the three blocks. This work provides different templates for preparation of gold nanoparticle array on silicon wafer, which can be adopted as an active surface-enhanced Raman scattering （SERS） substrate for poly（3-hexylthiophene） （P3HT）.In this paper, microphase behavior of an ABC triblock copolymer, polystyrene-block-poly（2-vinylpyridine）-block- poly（ethylene oxide）, namely PS-b-P2VP-b-PEO, was systematically studied during spin-coating and solvent vapor annealing based on various parameters, including the types of the solvent, spin speed and thickness. The morphological features and the microdomain location of the different blocks were characterized by atomic force microscope （AFM） and high resolution transmission electron microscopy （HRTEM）. With increasing thickness, the order-order transition from nanopores array to the pattern of nanostripes was observed due to microdomain coarsening. These processes of pattern transformation were based on the selectivity of toluene for different blocks and on the contact time between solvent molecules and the three blocks. This work provides different templates for preparation of gold nanoparticle array on silicon wafer, which can be adopted as an active surface-enhanced Raman scattering （SERS） substrate for poly（3-hexylthiophene） （P3HT）.

关 键 词：SELF-ASSEMBLY Triblock copolymer NANOPATTERN Nanoparticle array Raman spectroscopy 

分 类 号：O631[理学—高分子化学]