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作 者:张维[1] 姚继明[1] 崔淑玲[1] ZHANG Wei YAO Ji-ming CUI Shu-ling(College of Textile and Garment, Hebei University of Science & Technology, Shijiazhuang 05001& China)
机构地区:[1]河北科技大学纺织服装学院,河北石家庄050018
出 处:《印染》2017年第6期20-23,共4页China Dyeing and Finishing
基 金:河北省科技计划项目(16274003D);石家庄市科学技术研究与发展计划(141191241A);博士科研启动基金(1181196)
摘 要:为研究温度在还原剂还原过程中的作用,将传统硫化钠(Na_2S)与环保型还原剂AS/氢氧化钠两种还原体系进行对比,采用浸染工艺,使硫化黑分别在不同温度下对织物恒温染色90 min,并测定了染液还原电位及染色织物K/S值、断裂强力和摩擦牢度等。结果表明,织物K/S值随温度的升高而增大,且AS体系略优于Na_2S体系。在最优染色温度85℃的条件下,AS体系染色织物的K/S值为25.12,耐干摩擦色牢度为4.5级,耐湿摩擦色牢度为3级,强力损失为161.05 N。In order to study the effect of temperature on reduction process, the traditional sodium sulfide (Na2S) reduction system and environment-friendly reducer AS/sodium hydroxide (Na2H) reduction system are selected for comparison. The fabrics are dyed by sulfur black at different temperatures for 90 min with dip dyeing process. The oxidation-reduction potential, K/S value, breaking strength and rub- bing fastness of dyed fabric are determined. The results show that the K/S value increased with the increase of temperature, and the AS system was slightly better than Na:S system. At the optimal dyeing temperature of 85 ℃, the K/S value of dyed fabric with AS system is 25.12, dry rubbing fastness is Grade 4.5, wet rubbing fastness is Grade 3, and strength loss is 161.05 N.
关 键 词:浸染 染色温度 硫化黑 氧化还原电位 还原剂 染色性能 棉织物
分 类 号:TS193.6[轻工技术与工程—纺织化学与染整工程]
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