平行磁场作用下电沉积Co-Ni-Mn-P磁性薄膜  

Preparation of Co-Ni-Mn-P Magnetic Thin Films by Electrodeposition under Parallel Magnetic Field

作　　者：郭俊锁 GUO Jun-suo(Wuhai Vocational and Technical College, Wuhai 016000, China)

机构地区：[1]乌海职业技术学院,内蒙古乌海016000

出　　处：《电镀与环保》2017年第2期25-28,共4页Electroplating & Pollution Control

摘　　要：在平行磁场作用下电沉积Co-Ni-Mn-P磁性薄膜。研究了平行磁场对电沉积过程及薄膜性能的影响。研究发现:施加平行磁场,有利于提高离子的传质速率,从而提高沉积效率。平行磁场作用下电沉积制备的Co-Ni-Mn-P磁性薄膜呈现出"枝晶状"结构,矫顽力和比饱和磁化强度更高。Co-Ni-Mn-P magnetic thin films were prepared by electrodepositon under parallel magnetic field. Effect of parallel magnetic field on electrodeposition process and the performances of thin films were studied. Results showed that parallel magnetic field was benefit to accelerate the ions transportation, then improve the electrodeposition efficiency. The Co-Ni-Mn-P magnetic thin films prepared under parallel magnetic field featuring crystalline structure, and the coercivity and saturation magnetization were higher.

关 键 词：平行磁场 Co-Ni-Mn-P磁性薄膜 矫顽力 比饱和磁化强度 

分 类 号：TQ153[化学工程—电化学工业]