金属镍在高压CO_2膨胀氯化胆碱-乙二醇型低共熔溶剂体系中的电沉积  

Electrodeposition of Nickel in a High Pressure CO_2 Expanded Deep Eutectic Solvent Based on Choline Chloride and Ethylene Glycol

作　　者：徐双慧[1] 许家伟[1] 李云猛 王江红[1] 鄢浩[1] 

机构地区：[1]上海大学环境化学与工程学院化工系,上海200444

出　　处：《广东化工》2017年第5期28-30,共3页Guangdong Chemical Industry

基　　金：国家自然科学基金(20604015;21176152)

摘　　要：在含有NiCl_2·6H_2O的高压CO_2膨胀氯化胆碱和乙二醇型低共熔体系中进行金属镍的电沉积,采用低倍显微镜、扫描电子显微镜、原子力显微镜、X射线衍射分析、显微硬度及厚度测试方法研究了乙二胺对金属镍镀层性能的影响。结果表明,在镀液中添加乙二胺可以成功电沉积得到光亮并且呈现银白色金属光泽的镍镀层,乙二胺的加入量在3.0~6.0 mol·L^(-1)范围内。Electrodeposition of nickel was performed in a high pressure CO2 expanded deep eutectic solvent（DES） based on choline chloride and ethylene glycol containing NiCl2·6H2O. Effects of ethylenediamine（EDA） on properties of nickel coating were studied by some analytic methods, such as scanning electron microscope（SEM） analysis, atomic force microscope（AFM） analysis, x-ray diffraction（XRD） analysis, micro hardness test and micro thickness test. The result indicates that bright nickel coatings with silver metallic luster can be obtained in the electroplating liquid containing the addition of EDA in the range of 3.0~6.0 mol·L^-1.

关 键 词：乙二胺 电沉积 CO2 镍镀层 低共熔溶剂 

分 类 号：O645.12[理学—物理化学] O645.42[理学—化学]