Refractive index measurement of dielectric samples using highly focused radially polarized light(Invited Paper)  

Refractive index measurement of dielectric samples using highly focused radially polarized light(Invited Paper)

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作  者:Guadalupe López-Morales Victor-Manuel Rico-Botero Rafael Espinosa-Luna Qiwen Zhan 

机构地区:[1]GIPYS Laboratory, Centro de Investigaciones en Optica, A. C., León, Gto 37150, México [2]Department of Electro-Optics and Photonics, University of Dayton, Dayton, OH 45469, USA

出  处:《Chinese Optics Letters》2017年第3期12-15,共4页中国光学快报(英文版)

基  金:GLM and VMRB acknowledge CONACYT-M6xico for the scholarship 353317 and 394565, respectively, which were given to them to do their graduate studies.

摘  要:In this Letter, a refractive index measurement of a dielectric sample using highly focused radially polarized light is reported. Through imaging analysis of the optical field at the pupil plane of a high numerical aperture (NA) objective lens reflected by the sample under study, the Brewster angle is found. Employing a high NA objective lens allows the measurement of multiple angles of incidence from 0° to 64° in a single shot. The refractive index of the sample is estimated using the measured Brewster angle. The experimental results are compared with the theoretical images computed with the Fresnel theory, and a good agreement is obtained.In this Letter, a refractive index measurement of a dielectric sample using highly focused radially polarized light is reported. Through imaging analysis of the optical field at the pupil plane of a high numerical aperture (NA) objective lens reflected by the sample under study, the Brewster angle is found. Employing a high NA objective lens allows the measurement of multiple angles of incidence from 0° to 64° in a single shot. The refractive index of the sample is estimated using the measured Brewster angle. The experimental results are compared with the theoretical images computed with the Fresnel theory, and a good agreement is obtained.

关 键 词:high Refractive index measurement of dielectric samples using highly focused radially polarized light 

分 类 号:O435.1[机械工程—光学工程] O436.3[理学—光学]

 

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