Improvement of reverse blocking performance in vertical power MOSFETs with Schottky–drain-connected semisuperjunctions  

作　　者：毛维 王海永 王晓飞 杜鸣 张金风 郑雪峰 王冲 马晓华 张进成 郝跃 

机构地区：[1]Key Laboratory of the Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices,School of Microelectronics,Xidian University,Xi'an 710071,China [2]Xian Aerosemi Technology Co.,LTD,Xi'an 710077,China

出　　处：《Chinese Physics B》2017年第4期425-432,共8页中国物理B（英文版）

基　　金：Project supported by the National Natural Science Foundation of China(Grant Nos.61574112,61334002,61306017,61474091,and 61574110);the Natural Science Basic Research Plan in Shaanxi Province of China(Grant No.605119425012)

摘　　要：To enhance the reverse blocking capability with low specific on-resistance,a novel vertical metal-oxidesemiconductor field-effect transistor（MOSFET） with a Schottky-drian（SD） and SD-connected semisuperjunctions（SDD-semi-SJ）,named as SD-D-semi-SJ MOSFET is proposed and demonstrated by two-dimensional（2D） numerical simulations.The SD contacted with the n-pillar exhibits the Schottky-contact property,and that with the p-pillar the Ohmic-contact property.Based on these features,the SD-D-semi-SJ MOSFET could obviously overcome the great obstacle of the ineffectivity of the conventional superjunctions（SJ） or semisuperjunctions（semi-SJ） for the reverse applications and achieve a satisfactory trade-off between the reverse breakdown voltage（BV） and the specific on-resistance（R_（on）A）.For a given pillar width and n-drift thickness,there exists a proper range of n-drift concentration（N）,in which the SD-D-semi-SJ MOSFET could exhibit a better trade-off of R_（on）A-BV compared to the predication of SJ MOSFET in the forward applications.And what is much valuable,in this proper range of N,the desired BV and good trade-off could be achieved only by determining the pillar thickness,with the top assist layer thickness unchanged.Detailed analyses have been carried out to get physical insights into the intrinsic mechanism of R_（on）A-BV improvement in SD-D-semi-SJ MOSFET.These results demonstrate a great potential of SD-D-semi-SJ MOSFET in reverse applications.To enhance the reverse blocking capability with low specific on-resistance,a novel vertical metal-oxidesemiconductor field-effect transistor（MOSFET） with a Schottky-drian（SD） and SD-connected semisuperjunctions（SDD-semi-SJ）,named as SD-D-semi-SJ MOSFET is proposed and demonstrated by two-dimensional（2D） numerical simulations.The SD contacted with the n-pillar exhibits the Schottky-contact property,and that with the p-pillar the Ohmic-contact property.Based on these features,the SD-D-semi-SJ MOSFET could obviously overcome the great obstacle of the ineffectivity of the conventional superjunctions（SJ） or semisuperjunctions（semi-SJ） for the reverse applications and achieve a satisfactory trade-off between the reverse breakdown voltage（BV） and the specific on-resistance（R_（on）A）.For a given pillar width and n-drift thickness,there exists a proper range of n-drift concentration（N）,in which the SD-D-semi-SJ MOSFET could exhibit a better trade-off of R_（on）A-BV compared to the predication of SJ MOSFET in the forward applications.And what is much valuable,in this proper range of N,the desired BV and good trade-off could be achieved only by determining the pillar thickness,with the top assist layer thickness unchanged.Detailed analyses have been carried out to get physical insights into the intrinsic mechanism of R_（on）A-BV improvement in SD-D-semi-SJ MOSFET.These results demonstrate a great potential of SD-D-semi-SJ MOSFET in reverse applications.

关 键 词：vertical MOSFET Schottky-drain-connected semisuperjunction （SD-D-semi-SJ） reverse block- ing specific on-resistance 

分 类 号：TN386[电子电信—物理电子学]