Performance analysis of SiGe double-gate N-MOSFET  

作　　者：A.Singh D.Kapoor R.Sharma 

机构地区：[1]Department of Electronics and Communication Engineering,Vaish College of Engineering,Rohtak 124001,India [2]Department of Electronics and Communication Engineering,Northern India Engineering College,New Delhi 110053,India

出　　处：《Journal of Semiconductors》2017年第4期38-44,共7页半导体学报（英文版）

摘　　要：The major purpose of this paper is to find an alternative configuration that not only minimizes the limitations of single-gate（SG） MOSFETs but also provides the better replacement for future technology.In this paper,the electrical characteristics of SiGe double-gate N-MOSFET are demonstrated and compared with electrical characteristics of Si double-gate N-MOSFET.Furthermore,in this paper the electrical characteristics of Si doublegate N-MOSFET are demonstrated and compared with electrical characteristics of Si single-gate N-MOSFET.The simulations are carried out for the device at different operational voltages using Cogenda Visual TCAD tool.Moreover,we have designed its structure and studied both Id-Vg characteristics for different voltages namely 0.05,0.1,0.5,0.8,1 and 1.5 V and Id-Vd characteristics for different voltages namely 0.1,0.5,1 and 1.5 V at work functions 4.5,4.6 and 4.8 eV for this structure.The performance parameters investigated in this paper are threshold voltage,DIBL,subthreshold slope,GIDL,volume inversion and MMCR.The major purpose of this paper is to find an alternative configuration that not only minimizes the limitations of single-gate（SG） MOSFETs but also provides the better replacement for future technology.In this paper,the electrical characteristics of SiGe double-gate N-MOSFET are demonstrated and compared with electrical characteristics of Si double-gate N-MOSFET.Furthermore,in this paper the electrical characteristics of Si doublegate N-MOSFET are demonstrated and compared with electrical characteristics of Si single-gate N-MOSFET.The simulations are carried out for the device at different operational voltages using Cogenda Visual TCAD tool.Moreover,we have designed its structure and studied both Id-Vg characteristics for different voltages namely 0.05,0.1,0.5,0.8,1 and 1.5 V and Id-Vd characteristics for different voltages namely 0.1,0.5,1 and 1.5 V at work functions 4.5,4.6 and 4.8 eV for this structure.The performance parameters investigated in this paper are threshold voltage,DIBL,subthreshold slope,GIDL,volume inversion and MMCR.

关 键 词：double gate MOSFET DIBL GIDL volume inversion SiGe Genius tool 

分 类 号：TN386[电子电信—物理电子学]