微焦点X射线数字成像系统的最佳分辨率  

The Optimum Resolution of The Microfocus X-ray Inspection System

作　　者：刘骏 杨龙 刘军 

机构地区：[1]无锡日联科技股份有限公司,江苏无锡214145 [2]中信戴卡股份有限公司,河北秦皇岛066011

出　　处：《电子工业专用设备》2017年第2期1-3,54,共4页Equipment for Electronic Products Manufacturing

摘　　要：根据微焦点X射线数字成像检测系统在半导体行业中实际应用的要求,通过推导得出微焦点X射线数字成像检测系统的分辨率与放大倍数的数据关系式,并带入到实际的检测系统中,绘制出了系统分辨率与放大倍数关系曲线;通过曲线说明了应用在半导体行业的微焦点X射线数字成像检测系统,在一定放大倍数范围内,系统具有最佳分辨率,并通过实验的数据与理论值对比,验证了结论的正确性。Based on the requirements of the microfocus X-ray inspection system application in the electronicsemiconductor industry, derived the relation formula of resolution and magnification in the microfocus X-ray inspection system and used the formula into the actual system, to draw the system resolution and the magnification relation curves. Through the curve illustrates when a microfocus X-ray inspection system is used in the electronic semiconductor industry, within a certain range magnification, system has the optimum resolution. And by comparison with experimental data and theoretical data to verify the validity of the conclusion.

关 键 词：微焦点X射线 最佳分辨率 放大倍数 

分 类 号：TN405[电子电信—微电子学与固体电子学]