基于专利数据的低温等离子体领域技术市场发展现状与趋势分析  

The Research on Current Situation and Trend in the Field of Low-Temperature Plasma Based on Patent Data

作　　者：李闽慧 陆群[1] 陶性铭[1] 程宇宸 LI Min-hui LU Qun TAO Xing-ming CHENG Yu-chen(Institute of Scientific and Technical Information of Nanjing,Nanjing 210018,China Nanjing Huakehaona Electrical Science＆Technology Co. , LTD, Nanjing 210012, China)

机构地区：[1]南京市科技信息研究所,南京210018 [2]南京华科皓纳电气科技有限责任公司,南京210012

出　　处：《科技和产业》2017年第4期130-133,共4页Science Technology and Industry

基　　金：2016年南京市科技信息研究所所级课题

摘　　要：以1985—2015年国内低温等离子体领域的专利数据为对象进行分析,通过对该领域技术研发活跃度、主要专利权利人、专利区域分布的统计分析研究低温等离子体领域的技术发展现状;通过对该领域的技术构成及应用领域的统计分析研究低温等离子体领域技术发展趋势。以期为高校、科研院所及企业确定研发重点,发掘技术市场提供参考。In this paper,the patent data in the field of low-temperature plasma from 1985 to 2015is analyzed.Through the analysis of the technical activity,major patentee,patent distribution to research the current situation of technology in the field of low-temperature plasma;Through the analysis of the technology composition and applications to research the trend of technology in the field of low-temperature plasma;in order to help universities and companies to make sure the technical priorities,and give the suggestion for exploring the technology market.

关 键 词：专利数据 低温等离子体 现状及趋势 

分 类 号：O213[理学—概率论与数理统计]