纳米晶NiO薄膜的电化学沉积及其光学性能研究  

Electrochemical deposition of nanocrystalline NiO thin films and their optical properties

作　　者：吴朝晖[1,2] 甘小燕[2,3] 杜湘军 刘克永 

机构地区：[1]东莞市凯昶德电子科技股份有限公司,广东东莞523710 [2]武汉理工大学材料学院,武汉430070 [3]武汉理工大学汽车工程学院,武汉430070

出　　处：《功能材料》2017年第4期4105-4109,共5页Journal of Functional Materials

基　　金：中国博士后科学基金资助项目(2014M550415)

摘　　要：以Ni(NO_3)_2水溶液为沉积液,采用阴极电化学沉积法在FTO导电玻璃上制备了纳米晶NiO薄膜。通过X射线衍射、紫外-可见光透过谱等手段表征薄膜结晶性、表面微观形貌以及光学特性。结果表明,沉积电位以及沉积时间均对电化学沉积法薄膜沉积过程存在重要影响。在优化条件下(沉积电压为-0.9V、沉积时间为2~5min),所获薄膜致密均一,无裂纹,对可见光的透过率高达85%。Nanocrystalline NiO thin films were deposited on FTO-coated glass substrates by a cathodic electro chemical deposition method by using Ni（NO3）2 aqueous solution as electrolyte. Crystallinity, surface morpholo gy and optical properties of NiO thin films obtained were characterized by XRD, ultraviolet and visible transmittance spectrum and so on. Results show that deposition of NiO is greatly affected by the deposition po- tential and deposition time. At optimal conditions （--0.9 V for 2-5 min）, NiO thin film obtained is dense, uni- form and pin-hole free in surface morphology and the transmittance of which in the visible range is as high as 85%.

关 键 词：NIO 电化学沉积 微观结构 光学特性 

分 类 号：O484[理学—固体物理]