SiO_2微盘腔的湿法腐蚀工艺研究  

Research on Silica Microdisk by Wet-etching

作　　者：杨文[1] 龙浩[1] 郭长磊[1] 江水森 张保平[1] 蔡志平[1] 应磊莹[1] 

机构地区：[1]厦门大学信息科学与技术学院,福建厦门361005

出　　处：《厦门大学学报（自然科学版）》2017年第3期410-415,共6页Journal of Xiamen University：Natural Science

基　　金：中航工业产学研项目(CXY2011XD24);中国博士后科学基金(2015M582041)

摘　　要：SiO_2回音壁模式(whispering gallery mode,WGM)的光学谐振腔具有品质因子Q值高、模式体积小、制作简单等优点,在腔量子电动力学、生物传感器、滤波器、非线性光学等领域具有非常好的应用前景.采用热氧化生长SiO_2、光刻图形化、磁控溅射生长Cr掩膜、HF缓冲液湿法腐蚀SiO_2、KOH溶液湿法腐蚀Si并去除Cr掩膜等工艺,得到了周期化、尺寸不同的SiO_2微盘腔,其直径分别为20,40和60μm.利用原子力显微镜表征微盘腔表面的粗糙度,均方根表面粗糙度仅为0.469nm.在未经任何表面处理或者激光处理的情况下,利用连续波长可调激光器,通过光纤锥与微盘腔耦合,透射谱测量得到微盘腔的自由光谱范围(free spectrum range,FSR)为λFSR=9.6nm,Q值约为1×10~4.The whispering gallery mode （WGM） optical resonator enjoys advantages of high Q factor and small mode volume.The research on cavity quantum electrodynamics, biosensors, filters and nonlinear optics faces a very promising prospect.The microstruc- tures of silica microdisk with different diameters （20,40,60μm） were obtained by thermal oxidation, photolithography, magnetron sputtering, HF wet etching and KOH solution wet etching.The silicon backbone was octagonal pyramid,yielding smaller connection area with top silica microdisk and weaker inference on WGM in it.The surface of silica microdisk was also characterized by Atomic Force Microscopy.The surface of silica was smooth,and the Root-Mean-Square （RMS） roughness was 0. 469 nm.The Q factor and FSR of 60 μm microdisk are 1x 10^4 and 9.6 nm.

关 键 词：回音壁 KOH溶液 微盘腔 自由光谱范围 Q值 

分 类 号：TN305.2[电子电信—物理电子学]