Growth of mirror-like ultra-nanocrystalline diamond(UNCD)films by a facile hybrid CVD approach  

作　　者：阳硕 满卫东 吕继磊 肖雄 游志恒 江南 

机构地区：[1]Provincial Key Laboratory of Plasma Chemistry and Advanced Materials,Wuhan Institute of Technology,Wuhan 430073,People's Republic of China [2]Key Laboratory of Marine New Materials and Related Technology,Zhejiang Key Laboratory of Marine Materials and Protection Technology,Ningbo Institute of Material Technology&Engineering,Chinese Academy of Sciences,Ningbo 315201,People's Republic of China

出　　处：《Plasma Science and Technology》2017年第5期74-79,共6页等离子体科学和技术（英文版）

基　　金：supported by the program of international S&T cooperation(Agreement No.S2015ZR1100)

摘　　要：In this study, growth of mirror-like ultra-nanocrystalline diamond（UNCD） films by a facile hybrid CVD approach was presented. The nucleation and deposition of UNCD films were conducted in microwave plasma CVD（MPCVD） and direct current glow discharge CVD（DC GD CVD） on silicon substrates, respectively. A very high nucleation density（about 1×10^11 nuclei cm^-2） was obtained after plasma pretreatment. Furthermore, large area mirrorlike UNCD films of Φ 50 mm were synthesized by DC GD CVD. The thickness and grain size of the UNCD films are 24 μm and 7.1 nm, respectively. In addition, the deposition mechanism of the UNCD films was discussed.In this study, growth of mirror-like ultra-nanocrystalline diamond（UNCD） films by a facile hybrid CVD approach was presented. The nucleation and deposition of UNCD films were conducted in microwave plasma CVD（MPCVD） and direct current glow discharge CVD（DC GD CVD） on silicon substrates, respectively. A very high nucleation density（about 1×10^11 nuclei cm^-2） was obtained after plasma pretreatment. Furthermore, large area mirrorlike UNCD films of Φ 50 mm were synthesized by DC GD CVD. The thickness and grain size of the UNCD films are 24 μm and 7.1 nm, respectively. In addition, the deposition mechanism of the UNCD films was discussed.

关 键 词：plasma pretreatment microwave plasma CVD direct current glow discharge CVD ultra-nanocrystalline diamond films 

分 类 号：O484[理学—固体物理] O539[理学—物理]