掩膜诱导的光敏性三组分聚合物混合体系的自组装  

Self-assembly of Photosensitive Ternary Blend Directed by Mask

作　　者：李志海[1] 潘俊星 张进军[2] 孙敏娜[2] 郭宇琦[1] 岑建勇[2] 武海顺[1] 

机构地区：[1]山西师范大学化学与材料科学学院,临汾041004 [2]山西师范大学物理与信息工程学院,临汾041004

出　　处：《高分子学报》2017年第5期768-775,共8页Acta Polymerica Sinica

基　　金：国家自然科学基金(基金号21373131;11605108);山西省自然科学基金(基金号2015011004);山西省研究生教育创新项目(项目号2016BY094);山西省高等学校科技创新项目(项目号WL2015KJCX-SJ-03)资助

摘　　要：采用含时金兹堡-朗道理论(time-dependent Ginzburg-Landau theory)研究了二维体系中光敏性三组分聚合物混合体系在掩膜诱导下的相行为.详细探讨了光化学反应速率、聚合物组分比和掩膜长宽比对相分离行为的影响.获得了不同条件下体系形貌结构的相图,通过对这些相图的分析得到了岛状、网络状、层状等有序结构形成的条件.研究表明,固定掩膜的长宽比(L:d=6:4),当C组分的浓度?C<0.35和光化学反应速率Γ>1×10^(-5)时,体系形成岛状结构;当?C>0.4和Γ>1×10^(-5)时,体系主要形成层状和网状结构.固定光化学反应速率(Γ=1×10^(-3)),当6:5≤L:d≤6:1和?C<0.35时,体系形成岛状结构;当6:6≤L:d≤6:1和?C>0.4时,体系主要形成层状和网状结构.固定C组分的浓度(?C=0.45),当Γ≥5×10^(-4)和6:6≤L:d≤6:1时,体系主要形成层状和网状结构.稳定性分析表明这些有序结构在去掉掩膜之后仍能稳定存在.The phase behavior of a ternary blend with photochemical reaction induced by a mask are investigated via the Time-Dependent Ginzburg-Landau theory. The effects of the composition ratio, the length-width ratio of the photomask, and thephotoreaction rate coefficient on the domain structure and formation are systematically investigated. Through analysis of the phase diagram, the conditions for the formation of the ordered structures, such as island-like, network-like, and lamellar structures, are obtained. When the photoreaction rate coefficient F is not larger than 1 × 10^-5, the system forms a disordered structure, regardless of the strong variations in the C component concentration and the length-width ratio of the photomask. Firstly, when the length-width ratio of the photomask is fixed （L：d = 6：4）, with increasing the photochemical reaction rate, the disordered morphology transforms to island-like structure when Фc 〈 0.35; it forms disordered structure again when 0.35 〈 Ф 〈 0.4; a transition of disordered strcture-lamellar strcture-network structure occurs in the system when Фc 〉 0.4. Secondly, when the photoreaction rate coefficient is fixed （F = 1 × 10^-3）, with increasing C component concentration, the system shows a multiple morphology transition of island-like - disordered - lamellar - network when 6：4 〈 L：d 〈 6：1; when 6：6 〈 L：d 〈 6：4, the island-like structure changes to disordered and then to network structure. Finally, when the C component concentration is fixed （~ = 0.45）, with the decrease in the length-width ratio of the photomask, the morphology transforms from disordered to lamellar, and then to network when 1 × 10-5 〈 F 〈 5 ×10-4; when 5 × 10-4≤Г〈 1 × 10-2, the lamellar structure turns to network structure; and when F〉 1 × 10-2, the photochemical reaction rate is so fast that the A/B blend does not undergo the phase separation, and the macro-morphology transforms from lamellar to network. In addition, to gain insight into the stabil

关 键 词：自组装 光化学反应 聚合物混合物 掩膜 

分 类 号：O631.1[理学—高分子化学]