聚氨酯抛光垫机械抛光钆镓石榴石晶片  

Mechanically polish gadolinium gallium garnet crystal with polyurethane polishing pad

作　　者：张浩然[1] 金洙吉[1] 王紫光[1] 韩晓龙[1] 

机构地区：[1]大连理工大学机械工程学院,辽宁大连116024

出　　处：《金刚石与磨料磨具工程》2017年第2期26-30,共5页Diamond & Abrasives Engineering

基　　金：国家重点研发计划课题(2016YFB1102205)

摘　　要：钆镓石榴石(gadolinium gallium garnet,GGG)晶片是一种性能优良的激光材料,但其在抛光后易产生划痕、效率低。为保证GGG晶片的平面度、提高抛光效率,同时控制划痕现象,使用聚氨酯抛光垫进行机械抛光,研究抛光压力、抛光盘转速对平面度和表面粗糙度的影响。研究表明:使用聚氨酯抛光垫可以有效避免加工过程中产生划痕。在载荷127g/cm2,转速70r/min的条件下,抛光30min后的平面度可达到226nm,表面粗糙度RMS可达到36.3nm;表面缺陷较小,可被后续化学机械抛光很快去除。GGG （gadolinium gallium garnet） wafer is an excellent kind of laser material. However, its surface is easily scratched and the efficiency low during the polishing process. In order to avoid the scarification and improve polishing effect, polyurethane polishing pad was used to mechanically polish the GGG wafer. The influences of working pressure and plate speed on the flatness and surface quality were researched. Results show that the polyurethane polishing pad could avoid the appearance of scarification efficiently and that smaller abrasive is better for the flatness. Under the optimized parameters （70 r/minand 127 g/cm2）, the flatness could reach 226 nm, with surface roughnessRM,S 36.3 nm and the defects of the surface could be easily eliminated by chemical mechanical polishing.

关 键 词：钆镓石榴石(GGG)晶体 平面度 划痕 抛光垫 

分 类 号：TG58[金属学及工艺—金属切削加工及机床]