激光双光束干涉制备ZnO表面亚微米孔阵列结构  

Submicro-Hole Array Fabricated Using Two-Beam Interference on ZnO Surface

作　　者：贾鑫[1] 赵仙荣[1] 张江[1] 王华[1] J IAXin ZHAO Xianrong ZHANG J ian g WANG Hua(Department of Mathematics and Physics, Shanghai Dianji University, Shanghai 201306, China)

机构地区：[1]上海电机学院数理教学部,上海201306

出　　处：《上海电机学院学报》2017年第2期69-72,共4页Journal of Shanghai Dianji University

基　　金：国家自然科学基金项目资助(11104178);上海市教育委员会科研创新项目资助(14YZ156);上海市大学生创新活动计划项目资助(A1-5701-16-011-03-84)

摘　　要：利用飞秒激光双光束干涉技术,在ZnO晶体表面制备亚微米孔阵列结构。该结构由微米光栅结构和亚微米孔组成。其中,微米光栅结构由双光束干涉的光强分布决定。亚微米孔由激光诱导长周期条纹演化而成,双光束干涉对光强的局域在形成过程中起了重要的作用。调节照射激光波长能够制备不同尺寸的纳米孔阵列,在激光纳米加工中具有潜在的应用价值。A submicro-hole array is fabricated using interference between two femtosecond laser beams on a ZnO surface. The submicro-hole array is composed of a micro-grating structure and sub-micro-holes. The micro-grating structure is determined by the intensity pattern of the two-beam in-terference. The submicro-holes are a result of growth of laser-induced long periodic ripples, in which the two-beam interference plays an important role. Nanohole arrays with different sizes can be fabricated by adjusting the laser wavelength. They have potential applications in the field of fem-tosecond laser nanofabrication.

关 键 词：秒激光 双光束干涉 亚微米孔阵列 

分 类 号：TB383[一般工业技术—材料科学与工程] O436.3[机械工程—光学工程]