半导体生产含砷废水处理回用工程  

Treatment and recycle project on arsenic-containing wastewater from semiconductor production

作　　者：柳廷龙 肖祥江 单吉云 李苏滨 惠峰 李雪峰 田东 卢纪军 

机构地区：[1]云南中科鑫圆晶体材料有限公司,云南昆明650503

出　　处：《工业水处理》2017年第4期96-98,共3页Industrial Water Treatment

摘　　要：采用沉淀法—电絮凝法—气浮法—膜分离法四段组合工艺对含砷废水进行处理,原水含砷180~230mg/L,经该工艺处理后出水含砷<0.03 mg/L,去除率>99.9%。工程运行实践证明:该系统运行稳定、处理效果高,产出的清水用作生产用循环冷却水,大大降低了生产成本。The four-section combined process,chemical precipitation-electrocoagulation-DAF-membrane separation,has been applied to the treatment of arsenic-containing wastewater. After the raw water,whose arsenic content is180-230 mg/L,has been treated by this process,the arsenic content of effluent is reduced to less than 0.03 mg/L,and the removing rate is more than 99.9%. The running result of the project shows that the system runs stably,and has high treatment efficiency. The produced clear water can be used as circulating cooling water,lowering the production cost greatly.

关 键 词：含砷废水 回用 半导体材料 

分 类 号：X703[环境科学与工程—环境工程]