微/纳米CVD金刚石涂层沉积工艺参数优化  

Process Parameters Optimization of Micro/Nano-crystalline CVD Diamond Coatings

作　　者：许晨阳[1] 解亚娟[1] 邓福铭[1] 陈立[1,2] 雷青[1] 

机构地区：[1]中国矿业大学(北京)超硬刀具材料研究所,北京100083 [2]信利光电股份有限公司,汕尾516600

出　　处：《人工晶体学报》2017年第5期890-896,共7页Journal of Synthetic Crystals

基　　金：国家自然科学基金(51172278);北京市自然科学基金(15L00025);北京教委科技成果转化项目(2010-583)

摘　　要：通过正交实验设计工艺参数,利用热丝化学气相沉积法(HFCVD)制备金刚石涂层,采用扫描电镜、洛氏硬度计、X射线衍射仪等对金刚石涂层进行性能表征,同时进行切削试验,从而确定微米层和纳米层最佳的碳源浓度、沉积气压、热丝与基体间距。结果表明:最优微米金刚石涂层沉积工艺参数为碳源浓度2%,沉积气压3 k Pa,热丝/基体间距5 mm。最优纳米金刚石涂层沉积工艺参数为碳源浓度5%,沉积气压5 k Pa,热丝/基体间距8 mm。The process parameters were designed by orthogonal experiment. Diamond coatings were synthesized by Hot Filament Chemical Vapor Deposition （HFCVD） and the scanning electron microscopy （SEM）, rockwell hardness tester, X-ray diffraction （XRD） were used to test the coating properties and cutting tests to determine the optimum carbon source concentration, deposition pressure and hot wire/ substrate spacing for the micro and nano layers. The results show that the optimum micro-diamond coating deposition process parameters are carbon source concentration of 2%, deposition pressure 3 kPa, hot wire/substrate spacing 5 mm. The optimum nano-diamond coating deposition process parameters are Carbon source concentration of 5%, deposition pressure 5 kPa, hot wire/substrate spacing 8 mm.

关 键 词：碳源浓度 沉积气压 热丝与基体间距 

分 类 号：O781[理学—晶体学]