模具自由曲面变轨迹抛光技术研究  

Variable trajectory polishing technology for free-form surface mould

作　　者：吴晓君[1] 马长捷[1] 陈竹[1] 祁玫丹 

机构地区：[1]西安建筑科技大学机电工程学院,陕西西安710055

出　　处：《兵器材料科学与工程》2017年第3期1-6,共6页Ordnance Material Science and Engineering

基　　金：国家自然科学基金(51375361)

摘　　要：针对模具自由曲面抛光效率低、磨粒抛光轨迹均匀性差的问题,提出一种变轨迹弹性抛光轮技术。介绍了弹性抛光轮工具的工作原理与机械结构设计,以Preston方程结合赫兹接触理论为指导,对抛光接触区内的压力分布、速度分布和磨粒抛光轨迹均匀性进行研究,建立抛光工具的材料去除模型。基于运动学模型,利用Matlab对弹性抛光轮工具在不同转速比下的抛光轨迹进行仿真,并根据均匀性评价标准对仿真结果进行对比分析。结果表明:转速比对磨粒抛光轨迹均匀性有重要影响,在下压量为0.5 mm、抛光接触圆直径为5 mm、公转3周时,转速比为10.645 751的CV值比转速比为10时降低了32%;当转速比趋于无理数时,抛光轨迹均匀性明显优于整数转速比,去除函数更加饱满。Due to the low efficiency of mould free-form surface polishing and the poor uniformity of abrasive polishing trajectory, This paper presents a variable trajectory elastic polishing wheel technology. The working principle of the elastic wheel polishing tools and the mechanical structure design were introduced. Based on Preston equation and Hertz contact theory, pressure distribution, velocity distribution and particle trajectories uniformity in the polishing contact area were studied, and the removal model of the polishing tool material was established. Based on the kinematics model, Matlab was used to simulate the polishing trajectory of the elastic polishing wheel tool at different speeds, and the simulation results were analyzed. The results show that the speed ratio has an important influence on the trajectory uniformity. When the descending distance is 0.5 ram, contact circle diameter is 5 mm, and after three turns of the polishing tool, the CV value under the speed ratio of 10.645 751 is reduced by 32% than under that of 10. Irrational speed ratio is obviously superior to the integer ratio.

关 键 词：变轨迹抛光技术 弹性抛光轮工具 去除函数 抛光轨迹均匀性 

分 类 号：TG580.695[金属学及工艺—金属切削加工及机床]