光电-Fenton体系中羟基自由基生成影响因素分析  

Analysis of factors influencing hydroxyl radical formation in photoelectro-Fenton system

作　　者：孙梅香 刘会应 刘松[1] 胡耀笛 张利[1] 张业中[1] 戴捷[1] 

机构地区：[1]长江大学化学与环境工程学院,荆州434023

出　　处：《环境工程学报》2017年第6期3391-3398,共8页Chinese Journal of Environmental Engineering

基　　金：国家自然科学基金资助项目(21173026);湖北省自然科学基金重点项目(2013CFA107)

摘　　要：以TiO_2/Ti为阳极,活性炭纤维(ACF)为阴极,建立新型光电-Fenton体系。采用Box-Behnken Design(BBD)响应曲面法设计实验,考察初始pH、反应时间、电流密度和曝气量4个因素及其交互作用对光电-Fenton体系中·OH生成量的影响,建立·OH生成量与影响因素间的数学模型,并进行参数优化,探索光电-Fenton运行的最优参数值。研究表明,4因素对·OH生成量的影响强弱顺序为:pH>反应时间>电流密度>曝气量,且4因素两两之间均存在一定的交互作用,其中反应时间与pH和曝气量之间的交互效应尤为显著。在pH 4.49、反应时间130.49 min、电流密度6.99 m A·cm-2、曝气量1 474.90 m L·min^(-1)条件下,·OH的生成量最大。经实验验证,实际值与模型预测值拟合性良好,偏差仅为2.35%。A new type of photoelectro-fenton （PEF） system with TiO2/Ti as the anode and an activated carbon fiber （ACF） as the cathode was established. The Box-Behnken Design （BBD） response surface methodology （RSM） was used to design the experiments for investigating the individual and interactive effects of initial pH value, application time, current density, and aeration rate on the amount of · OH produced during the PEF re- action process. A quadratic model was developed to correlate the variables to the amount of · OH, and the a- mount of 2 OH was optimized to study the optimal operating parameters. The RSM analysis results demonstrated that the magnitude of the effects of individual operation parameters on the amount of · OH were, in descending order, pH 〉 application time 〉 current density 〉 aeration rate. There were some interactions between the 4 fac- tors. The interactions of pH, aeration rate, and application time were particularly significant. The highest maxi- mum amount of ·OH was achieved at an initial pH value of 4.49, application time of 130. 49 min, and current density of 6.99 mA · cm-2. The experimental values agreed with the predicted values of the model equation with only a 2.35% deviation.

关 键 词：光电-Fenton BBD 响应曲面法 羟基自由基 交互作用 

分 类 号：X703[环境科学与工程—环境工程]