氧化锌薄膜的准分子激光退火热效应模拟分析  

Thermal Effect Simulation Analysis on Excimer Laser Annealing of Zinc Oxide Thin Films

作　　者：邵景珍[1] 王玺[2] 胡红涛[1] 方晓东[1] 

机构地区：[1]中国科学院安徽光学精密机械研究所安徽省光子器件与材料重点实验室,安徽合肥230031 [2]电子工程学院脉冲功率激光技术国家重点实验室,安徽合肥230037

出　　处：《激光与光电子学进展》2017年第6期153-158,共6页Laser & Optoelectronics Progress

基　　金：脉冲功率激光技术国家重点实验室开放研究基金项目(SKL2014KF03)

摘　　要：基于热传导方程建立了ZnO薄膜的准分子激光辐照理论模型,模拟分析了KrF准分子激光辐照ZnO薄膜的热效应。计算了薄膜的温度场分布和热流分布,讨论了激光作用过程中的温度随时间的变化关系,分析了激光能量密度对薄膜温度场的影响。模拟结果表明,ZnO薄膜的准分子激光退火具有急热骤冷特性,ZnO薄膜表面温度与激光能量密度呈线性增长关系,表面热熔融阈值为261mJ/cm2。Based on the heat conduction equation, a theoretical model related to the excimer laser irradiation of ZnO thin films is built. The thermal effect in the KrF excimer laser irradiation of ZnO thin films is simulated and analyzed. The distributions of temperature field and thermal flux of the films are calculated. The variation relationship between temperature and time during the laser action process is discussed. The influence of the laser energy density on the temperature field of the films is analyzed. The simulation results show that the excimer laser annealing process of ZnO thin films has the heat quench characteristic, the surface temperature of ZnO thin films increases linearly with the laser energy density, and the thermal melting threshold of film surfaces is 261 mJ/cm2.

关 键 词：激光技术 薄膜 准分子激光退火 有限元分析 ZnO 热效应 

分 类 号：TN249[电子电信—物理电子学]