硅胶负载铜基功能化离子液体合成及脱硫性能  

Synthesis and H_2S Adsorption Capacity of Cu-based Functionalized Ionic Liquid supported on SiO_2

作　　者：郭宇曦[1] 臧立华[1] 

机构地区：[1]齐鲁工业大学环境科学与工程学院,济南250353

出　　处：《齐鲁工业大学学报》2017年第3期16-20,共5页Journal of Qilu University of Technology

基　　金：国家科技支撑计划重点项目(2014BAC28B01;2014BAC25B01)

摘　　要：合成了有机胺型铜基离子液体Et_3NHCl·CuCl_2,并通过浸渍法分别将其负载到硅胶表面,得到负载型离子液体脱硫剂,记为Et_3NHCl·CuCl_2-SiO_2。采用FI-IR、BET等分析手段对其进行了表征,结果得到Et_3NHCl·CuCl_2成功负载硅胶表面,通过固定床脱硫系统对Et_3NHCl·CuCl_2-SiO_2吸附性能进行了吸附温度及气体质量流量等条件进行了优化,同时对最优脱硫剂进行了脱硫机理以及再生性能的探讨。结果表明,最佳脱硫温度为100℃,H_2S气体质量流量为100 mL/min,脱硫效率保持100%的时间高达100 min。XPS的测试表明H_2S与脱硫剂反应生成稳定产物CuS,脱硫剂可以在氧气中再生,由于再生过程会生成中间产物SO_2,因此采用较低流量的氧气使SO_2能够被硅胶短暂吸附或者全部转化成硫酸。Imidazole and Amine Cu-based ionic liquid Et3NHCl · CuCl2was synthesized according to literature and was loaded on SiO2 by impregnation method, the supported ionic liquid was obtained, noted as Et3 NHCl· CuCl2-SiO2. The properties of the syntheticionic liquid （ IL） was confirmed by FT-IR spectrum and BET.The results showed that Et3NHCl· CuCl2 was successfully supported on the surface of SiO2.The performance of Et3NHCl · CuCl2-SiO2 under different adsorption temperatures and gas flow rates were optimized, desulphurization mechanism and regeneration performance were discussed. The results showed that Et3NHCl·CuCl2-SiO2 had better performance for the adsorption of H2S,and the optimized desulfurization temperature and gas flow rate was 100 ℃ and 100 miymin, respectively, while the time for keeping 100% for Et3NHCl · CuCl2-SiO2 was 100 min.Stable product CuS was generated in the process of desulfurization by XPS.Et3NHCl ·CuCl2-SiO2 can be regenerated through O2. Low O2 flow rate was used to make SO2 adsorb on SiO2 in short time or convert into H2SO4, because of the production of SO2 in the process of regeneration.

关 键 词：硫化氢 功能化离子液体 硅胶 再生 

分 类 号：O647.33[理学—物理化学]