Atomically thin InSe:A high mobility two-dimensional material  被引量:1

Atomically thin InSe: A high mobility two-dimensional material

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作  者:FENG Wei ZHENG Wei GAO Feng HU PingAn 

机构地区:[1]Key Lab of Microsystem and Microstructure,Harbin Institute of Technology,Harbin 150080,China [2]School of Materials Science and Engineering,Harbin Institute of Technology,Harbin 150080,China

出  处:《Science China(Technological Sciences)》2017年第7期1121-1122,共2页中国科学(技术科学英文版)

基  金:supported by the National Key Basic Research Program of China(Grant No.2013CB632900);National Natural Science Foundation of China(Grant Nos.61390502&21373068);the Foundation for Innovative Research Groups of the National Natural Science Foundation of China(Grant No.51521003);Self-Planned Task of State Key Laboratory of Robotics and System(HIT)(Grant No.SKLRS201607B)

摘  要:Since silicon is limited by its physical properties,it is challenging and important to find candidate materials for high performance electronic devices.Two-dimensional(2D)semiconductor materials have attracted dramatically increasing interest due to their unique physical,

关 键 词:challenging promise candidate dramatically outperform compatible phosphorus fabrication extremely attributed 

分 类 号:TN304[电子电信—物理电子学]

 

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