高质量立方相ZnMgO的制备与紫外受激发射特性研究（英文）  

Realization of UVB Lasing in High Quality Cubic ZnMgO Films

作　　者：张晗[1] 裴磊磊[1] 宿世臣[1] 

机构地区：[1]广东省光电功能材料与器件重点实验室,华南师范大学光电材料与技术研究所,广东广州510631

出　　处：《发光学报》2017年第7期905-910,共6页Chinese Journal of Luminescence

基　　金：Supported by National Natural Science Foundation of China(61574063);Science and Technology Program of Guangdong Province(2016A040403106);Science and Technology Project of Guangzhou City(2016201604030047)~~

摘　　要：利用脉冲激光沉积(PLD)设备在蓝宝石衬底上制备了高质量Zn_(1-x)Mg_xO单晶薄膜,并对其结构和光学特性进行了深入细致的研究。通过能量衍射谱(EDS)确认Zn_(1-x)Mg_xO薄膜的Mg组分为45%。在Zn0.55Mg0.45O薄膜的X射线衍射谱(XRD)中观测到了明显的位于36.67°的衍射峰,对应的是(111)晶向的立方相ZnMgO。从透射光谱中可以看出,Zn0.55Mg0.45O具有陡峭的吸收边,没有发生相分离,在透射电镜图谱中也得到了证实。该ZnMgO薄膜还表现出了优异的光学特性,在Zn0.55Mg0.45O材料体系中实现了峰位位于310 nm的紫外光泵浦受激发射,其激光发射的阈值仅为22 k W/cm2。The optical and structural properties of high-quality epitaxial Zn（1-x）MgxO films deposited by pulsed-laser deposition（PLD） were studied. Zn（1-x）MgxO films with - 45% Mg incorporation were measured by EDS（Energy dispersive spectroscopy）. XRD（X-ray diffraction） measurement results show that Zn0. 55Mg0. 45 O films have a cubic phase structure without phase separation and are epitaxial grown along the c-axis of Al2O3 substrate. In the films,intense UVB optical pumped stimulated emission of this pure cubic-phase ZnMgO can be observed. The lasing threshold is about 22 k W/cm^2. Lasing occurs at UVB wavelength of - 310 nm under optical pumping.

关 键 词：氧化锌镁 脉冲激光沉积 阈值 

分 类 号：TN244[电子电信—物理电子学]