同时具有高红外辐射率及高电导率的多孔镍镀层  

Porous nickel coating with both high infrared radiation rate and high conductivity

作　　者：徐文彬[1,2] 郭嘉成 章志铖 朱荣玉[1] 王正波[3] 奚昊敏[3] 李建 郭兴伍[1] 

机构地区：[1]上海交通大学材料科学与工程学院,上海200240 [2]中国航天科技集团公司第八研究院第八O四研究所,上海201109 [3]中国航天科技集团公司第八研究院一四九厂,上海200245 [4]江苏中翼汽车新材料科技有限公司,江苏常熟215542

出　　处：《功能材料》2017年第7期7109-7114,共6页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(51371116);航天先进技术联合研究中心技术创新资助项目(USCAST2013-23);江苏省科技成果转化资助项目(BA2016039)

摘　　要：通过氢气泡模板法制备出了同时具备高电导率和高红外辐射率的多孔镍镀层,满足其在太空中散热以及电磁屏蔽的需要。分析研究了不同沉积时间、氯化铵和氯化镍浓度对多孔镍层孔径和红外发射率的影响。研究结果表明,随着孔洞投影面积比的增加,多孔镍层的红外发射率增加,通过工艺参数的优化,在不影响Ni镀层导电性能的前提下,制备出红外发射率为0.79的多孔镀镍膜层。Porous nickel coating with both high conductivity and high infrared radiation was prepared by the hy-drogen bubble template method 9 which can meet the needs of heat radiation and electromagnetic shielding in space. The effects of different deposition time,concentration of ammonium chloride and nickel chloride on the pore size and infrared emissivity of porous nickel layer were studied. The results show that with the increase of the ratio of hole projection area,the infrared emissivity of porous nickel layer increased. By optimizing the process parameters, the porous nickel film with infrared emissivity of 0.79 was prepared without affecting the conductive properties of Ni coatings.

关 键 词：红外辐射率 导电率 多孔Ni层 

分 类 号：TG174.441[金属学及工艺—金属表面处理]